PUB - Publikationen an der Universität Bielefeld

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• [30]
  

  2013 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2343895

  Modelling of infrared optical constants for polycrystalline low pressure chemical vapour deposition ZnO:B films
  Prunici P, Hamelmann F, Beyer W, Kurz H, Stiebig H (2013)
  Journal of Applied Physics 113(21): 123104.

  PUB | DOI | WoS
   
• [29]
  

  2009 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 2345328

  Surface modification of LPCVD ZNO-Films for silicon thin film solar cells
  Lükermann F, Mönkemöller V, Kurz H, Sacher M, Hamelmann F, Stiebig H, Heinzmann U (2009)
  In: Proceedings of the 24th EU PVSEC. 2299-2303.

  PUB | PDF | DOI
   
• [28]
  

  2009 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1589799

  Electrochromic mixed films based On WO3 and MoO3, obtained by an APCVD method
  Ivanova T, Gesheva KA, Kalitzova M, Hamelmann F, Lükermann F, Heinzmann U (2009)
  JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 11(10): 1513-1516.

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• [27]
  

  2006 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1874432

  Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers
  Wonisch A, Hamelmann F, Hachmann W, Heinzmann U (2006)
  In: Functional Properties of Nanostructured Materials. Kassing R, Petkov P, Kulisch W, Popov C (Eds); Dordrecht: Springer: 351-354.

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• [26]
  

  2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1601030

  Plasma-assisted chemical vapor deposited silicon oxynitride as an alternative material for gate dielectric in MOS devices
  Szekeres A, Nikolova T, Simeonov S, Gushterov A, Hamelmann F, Heinzmann U (2006)
  MICROELECTRONICS JOURNAL 37(1): 64-70.

  PUB | DOI | WoS
   
• [25]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1874437

  Technology and characterization of CVD-grown mixed Mo/W oxide films and electrochromic devices made on their basis
  Gesheva K, Ivanova T, Steinman E, Hamelmann F, Heinzmann U, Brechling A (2005)
  In: ECS Proceedings PV 2005-09. 799-799.

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• [24]
  

  2005 | Sammelwerksbeitrag | PUB-ID: 1874434

  Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications
  Ivanova T, Gesheva K, Hamelmann F, Hachmann W, Heinzmann U, Brechling A (2005)
  In: ECS Proceedings; PV 2005-09. 433-433.

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• [23]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604367

  Electrical properties of plasma-assisted CVD deposited thin silicon oxynitride films
  Szekeres A, Simeonov S, Gushterov A, Nikolova T, Hamelmann F, Heinzmann U (2005)
  JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 553-556.

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• [22]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604354

  Deposition of silicon oxide thin films in TEOS with addition of oxygen to the plasma ambient: IR spectra analysis
  Hamelmann F, Heinzmann U, Szekeres A, Kirov N, Nikolova T (2005)
  JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 389-392.

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• [21]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604360

  Optical and electrochromic characterization of multilayered mixed metal oxide thin films
  Hamelmann F, Gesheva K, Ivanova T, Szekeres A, Abrashev M, Heinzmann U (2005)
  JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 393-396.

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• [20]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1873183

  Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases
  Aschentrup A, Szekeres A, Gesheva K, Hamelmann F, Heinzmann U, Brechling A (2004)
  Vacuum 76 76(2-3): 139-142.

  PUB | DOI | WoS
   
• [19]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609015

  Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition
  Hamelmann F, Brechling A, Aschentrup A, Heinzmann U, Jutzi P, Sandrock J, Siemeling U, Ivanova T, Szekeres A, Gesheva K (2004)
  THIN SOLID FILMS 446(2): 167-171.

  PUB | DOI | WoS
   
• [18]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609091

  Light-stimulated switching of azobenzene-containing self-assembled monolayers
  Hamelmann F, Heinzmann U, Siemling U, Bretthauer F, der Bruggen JV (2004)
  APPLIED SURFACE SCIENCE 222(1-4): 1-5.

  PUB | DOI | WoS
   
• [17]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1606874

  Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions
  Hamelmann F, Aschentrup A, Brechling A, Heinzmann U, Gushterov A, Szekeres A, Simeonov S (2004)
  Vacuum 75(4): 307-312.

  PUB | DOI | WoS
   
• [16]
  

  2003 | Sammelwerksbeitrag | PUB-ID: 1882887

  Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor
  Hamelmann F, Brechling A, Aschentrup A, Heinzmann U, Jutzi P, Sandrock J, Siemeling U (2003)
  In: Chemical Vapor Deposition CVD XVI ECS Proceedings. Allendorf M, Maury F, Teyssandier F (Eds); .

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• [15]
  

  2001 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1616209

  Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD
  Hamelmann F, Aschentrup A, Schmalhorst J-M, Kleineberg U, Heinzmann U, Dittmar K, Jutzi P (2001)
  JOURNAL DE PHYSIQUE IV 11(PR3): 431-436.

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• [14]
  

  2000 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1883586

  The synthesis of Cyclopentadienyl silanes and disilanes and their fragmentation under thermal CVD conditions
  Klipp A, Petri SHA, Hamelmann F, Heinzmann U, Jutzi P (2000)
  In: Organosilicon Chemistry from Molecules to Materials IV, eds. N.Auner,J.Weis. Auer N, Weis J (Eds); VCH Weinheim: VCH: 806-806.

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• [13]
  

  2000 | Dissertation | PUB-ID: 2433882

  Herstellung von Metall-Silizium-Multischichten mit dem MOCVD-Verfahren
  Hamelmann F (2000) Berichte aus der Physik.
  Aachen: Shaker.

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• [12]
  

  2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1958189

  Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films
  Hamelmann F, Haindl G, Aschentrup A, Klipp A, Kleineberg U, Jutzi P, Heinzmann U (2000)
  In: Chemical Vapor Deposition CVD XV, ECS Proc. PV. Allendorf MD, Besman TM (Eds); 131.

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• [11]
  

  2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620849

  Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD
  Hamelmann F, Haindl G, Schmalhorst J-M, Aschentrup A, Majkova E, Kleineberg U, Heinzmann U, Klipp A, Jutzi P, Anopchenko A, Jergel M, et al. (2000)
  THIN SOLID FILMS 358(1-2): 90-93.

  PUB | DOI | WoS
   
• [10]
  

  2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620153

  Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films
  Klipp A, Hamelmann F, Haindl G, Hartwich J, Kleineberg U, Jutzi P, Heinzmann U (2000)
  CHEMICAL VAPOR DEPOSITION 6(2): 63-66.

  PUB | DOI | WoS
   
• [9]
  

  2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1883600

  In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors
  Hamelmann F, Klipp A, Petri SHA, Haindl G, Hartwich J, Kleineberg U, Jutzi P, Heinzmann U (2000)
  In: Organosilicon Chemistry IV: from Molecules to Materials. Auer N, Weis J (Eds); Weinheim: Wiley-VCH: 798-798.

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• [8]
  

  1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1622128

  Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing
  Luby S, Jergel M, Anopchenko A, Aschentrup A, Hamelmann F, Majkova E, Kleineberg U, Heinzmann U (1999)
  APPLIED SURFACE SCIENCE 150(1-4): 178-184.

  PUB | DOI | WoS
   
• [7]
  

  1999 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1622647

  Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY
  Kleineberg U, Menke D, Hamelmann F, Heinzmann U, Schmidt O, Fecher GH, Schoenhense G (1999)
  In: Journal of Electron Spectroscopy and Related Phenomena. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 103. ELSEVIER SCIENCE BV: 931-936.

  PUB | DOI | WoS
   
• [6]
  

  1999 | Zeitschriftenaufsatz | PUB-ID: 1883592

  Metal/Silicon multilayers produced by low temperature MOCVD
  Hamelmann F, Haindl G, Hartwich J, Klipp A, Majkova E, Kleineberg U, Jutzi P, Heinzmann U (1999)
  Mater.Res.Soc.Proc. 555: 19-19.

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• [5]
  

  1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1623447

  W/Si multilayers deposited by hot-filament MOCVD
  Hamelmann F, Petri SHA, Klipp A, Haindl G, Hartwich J, Dreeskornfeld L, Kleineberg U, Jutzi P, Heinzmann U (1999)
  THIN SOLID FILMS 338(1-2): 70-74.

  PUB | DOI | WoS
   
• [4]
  

  1998 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1624974

  Carbon/titanium multilayers as soft-x-ray mirrors for the water window
  Stock HJ, Haindl G, Hamelmann F, Menke D, Wehmeyer O, Kleineberg U, Heinzmann U, Bulicke P, Fuchs D, Ulm G (1998)
  APPLIED OPTICS 37(25): 6002-6005.

  PUB | DOI | WoS | PubMed | Europe PMC
   
• [3]
  

  1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637888

  Thermal stability of W1-xSix/Si multilayers under rapid thermal annealing
  Senderak R, Jergel M, Luby S, Majkova E, Holy V, Haindl G, Hamelmann F, Kleineberg U, Heinzmann U (1997)
  JOURNAL OF APPLIED PHYSICS 81(5): 2229-2235.

  PUB | DOI | WoS
   
• [2]
  

  1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637796

  Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors
  Stock HJ, Hamelmann F, Kleineberg U, Menke D, Schmiedeskamp B, Osterried K, Heidemann KF, Heinzmann U (1997)
  APPLIED OPTICS 36(7): 1650-1654.

  PUB | DOI | WoS | PubMed | Europe PMC
   
• [1]
  

  1996 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1638117

  Thermal stability of W1-xSix/Si multilayer reflective coatings under high intensity excimer laser pulses
  D'Anna E, Luches A, Martino M, Brunel M, Majkova E, Luby S, Senderak R, Jergel M, Hamelmann F, Kleineberg U, Heinzmann U (1996)
  In: Applied Surface Science. Applied Surface Science, 106. Elsevier: 166-170.

  PUB | DOI | WoS