30 Publikationen

Alle markieren

[30]
2013 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2343895
Modelling of infrared optical constants for polycrystalline low pressure chemical vapour deposition ZnO:B films
Prunici P, Hamelmann F, Beyer W, Kurz H, Stiebig H (2013)
Journal of Applied Physics 113(21): 123104.
PUB | DOI | WoS
 
[29]
2009 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 2345328
Surface modification of LPCVD ZNO-Films for silicon thin film solar cells
Lükermann F, Mönkemöller V, Kurz H, Sacher M, Hamelmann F, Stiebig H, Heinzmann U (2009)
In: Proceedings of the 24th EU PVSEC. 2299-2303.
PUB | PDF | DOI
 
[28]
2009 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1589799
Electrochromic mixed films based On WO3 and MoO3, obtained by an APCVD method
Ivanova T, Gesheva KA, Kalitzova M, Hamelmann F, Lükermann F, Heinzmann U (2009)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 11(10): 1513-1516.
PUB | WoS
 
[27]
2006 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1874432
Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers
Wonisch A, Hamelmann F, Hachmann W, Heinzmann U (2006)
In: Functional Properties of Nanostructured Materials. Kassing R, Petkov P, Kulisch W, Popov C (Eds); Dordrecht: Springer: 351-354.
PUB | DOI
 
[26]
2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1601030
Plasma-assisted chemical vapor deposited silicon oxynitride as an alternative material for gate dielectric in MOS devices
Szekeres A, Nikolova T, Simeonov S, Gushterov A, Hamelmann F, Heinzmann U (2006)
MICROELECTRONICS JOURNAL 37(1): 64-70.
PUB | DOI | WoS
 
[25]
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1874437
Technology and characterization of CVD-grown mixed Mo/W oxide films and electrochromic devices made on their basis
Gesheva K, Ivanova T, Steinman E, Hamelmann F, Heinzmann U, Brechling A (2005)
In: ECS Proceedings PV 2005-09. 799-799.
PUB
 
[24]
2005 | Sammelwerksbeitrag | PUB-ID: 1874434
Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications
Ivanova T, Gesheva K, Hamelmann F, Hachmann W, Heinzmann U, Brechling A (2005)
In: ECS Proceedings; PV 2005-09. 433-433.
PUB
 
[23]
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604367
Electrical properties of plasma-assisted CVD deposited thin silicon oxynitride films
Szekeres A, Simeonov S, Gushterov A, Nikolova T, Hamelmann F, Heinzmann U (2005)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 553-556.
PUB | WoS
 
[22]
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604354
Deposition of silicon oxide thin films in TEOS with addition of oxygen to the plasma ambient: IR spectra analysis
Hamelmann F, Heinzmann U, Szekeres A, Kirov N, Nikolova T (2005)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 389-392.
PUB | WoS
 
[21]
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604360
Optical and electrochromic characterization of multilayered mixed metal oxide thin films
Hamelmann F, Gesheva K, Ivanova T, Szekeres A, Abrashev M, Heinzmann U (2005)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 393-396.
PUB | WoS
 
[20]
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1873183
Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases
Aschentrup A, Szekeres A, Gesheva K, Hamelmann F, Heinzmann U, Brechling A (2004)
Vacuum 76 76(2-3): 139-142.
PUB | DOI | WoS
 
[19]
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609015
Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition
Hamelmann F, Brechling A, Aschentrup A, Heinzmann U, Jutzi P, Sandrock J, Siemeling U, Ivanova T, Szekeres A, Gesheva K (2004)
THIN SOLID FILMS 446(2): 167-171.
PUB | DOI | WoS
 
[18]
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609091
Light-stimulated switching of azobenzene-containing self-assembled monolayers
Hamelmann F, Heinzmann U, Siemling U, Bretthauer F, der Bruggen JV (2004)
APPLIED SURFACE SCIENCE 222(1-4): 1-5.
PUB | DOI | WoS
 
[17]
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1606874
Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions
Hamelmann F, Aschentrup A, Brechling A, Heinzmann U, Gushterov A, Szekeres A, Simeonov S (2004)
Vacuum 75(4): 307-312.
PUB | DOI | WoS
 
[16]
2003 | Sammelwerksbeitrag | PUB-ID: 1882887
Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor
Hamelmann F, Brechling A, Aschentrup A, Heinzmann U, Jutzi P, Sandrock J, Siemeling U (2003)
In: Chemical Vapor Deposition CVD XVI ECS Proceedings. Allendorf M, Maury F, Teyssandier F (Eds); .
PUB
 
[15]
2001 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1616209
Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD
Hamelmann F, Aschentrup A, Schmalhorst J-M, Kleineberg U, Heinzmann U, Dittmar K, Jutzi P (2001)
JOURNAL DE PHYSIQUE IV 11(PR3): 431-436.
PUB | WoS
 
[14]
2000 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1883586
The synthesis of Cyclopentadienyl silanes and disilanes and their fragmentation under thermal CVD conditions
Klipp A, Petri SHA, Hamelmann F, Heinzmann U, Jutzi P (2000)
In: Organosilicon Chemistry from Molecules to Materials IV, eds. N.Auner,J.Weis. Auer N, Weis J (Eds); VCH Weinheim: 806-806.
PUB
 
[13]
2000 | Dissertation | PUB-ID: 2433882
Herstellung von Metall-Silizium-Multischichten mit dem MOCVD-Verfahren
Hamelmann F (2000) Berichte aus der Physik.
Aachen: Shaker.
PUB
 
[12]
2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1958189
Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films
Hamelmann F, Haindl G, Aschentrup A, Klipp A, Kleineberg U, Jutzi P, Heinzmann U (2000)
In: Chemical Vapor Deposition CVD XV, ECS Proc. PV. Allendorf MD, Besman TM (Eds); 131.
PUB
 
[11]
2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620849
Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD
Hamelmann F, Haindl G, Schmalhorst J-M, Aschentrup A, Majkova E, Kleineberg U, Heinzmann U, Klipp A, Jutzi P, Anopchenko A, Jergel M, et al. (2000)
THIN SOLID FILMS 358(1-2): 90-93.
PUB | DOI | WoS
 
[10]
2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620153
Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films
Klipp A, Hamelmann F, Haindl G, Hartwich J, Kleineberg U, Jutzi P, Heinzmann U (2000)
CHEMICAL VAPOR DEPOSITION 6(2): 63-66.
PUB | DOI | WoS
 
[9]
2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1883600
In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors
Hamelmann F, Klipp A, Petri SHA, Haindl G, Hartwich J, Kleineberg U, Jutzi P, Heinzmann U (2000)
In: Organosilicon Chemistry IV: from Molecules to Materials. Auer N, Weis J (Eds); Weinheim: Wiley-VCH: 798-798.
PUB
 
[8]
1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1622128
Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing
Luby S, Jergel M, Anopchenko A, Aschentrup A, Hamelmann F, Majkova E, Kleineberg U, Heinzmann U (1999)
APPLIED SURFACE SCIENCE 150(1-4): 178-184.
PUB | DOI | WoS
 
[7]
1999 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1622647
Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY
Kleineberg U, Menke D, Hamelmann F, Heinzmann U, Schmidt O, Fecher GH, Schoenhense G (1999)
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA 103: 931-936.
PUB | DOI | WoS
 
[6]
1999 | Zeitschriftenaufsatz | PUB-ID: 1883592
Metal/Silicon multilayers produced by low temperature MOCVD
Hamelmann F, Haindl G, Hartwich J, Klipp A, Majkova E, Kleineberg U, Jutzi P, Heinzmann U (1999)
Mater.Res.Soc.Proc. 555: 19-19.
PUB
 
[5]
1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1623447
W/Si multilayers deposited by hot-filament MOCVD
Hamelmann F, Petri SHA, Klipp A, Haindl G, Hartwich J, Dreeskornfeld L, Kleineberg U, Jutzi P, Heinzmann U (1999)
THIN SOLID FILMS 338(1-2): 70-74.
PUB | DOI | WoS
 
[4]
1998 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1624974
Carbon/titanium multilayers as soft-x-ray mirrors for the water window
Stock HJ, Haindl G, Hamelmann F, Menke D, Wehmeyer O, Kleineberg U, Heinzmann U, Bulicke P, Fuchs D, Ulm G (1998)
APPLIED OPTICS 37(25): 6002-6005.
PUB | DOI | WoS | PubMed | Europe PMC
 
[3]
1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637888
Thermal stability of W1-xSix/Si multilayers under rapid thermal annealing
Senderak R, Jergel M, Luby S, Majkova E, Holy V, Haindl G, Hamelmann F, Kleineberg U, Heinzmann U (1997)
JOURNAL OF APPLIED PHYSICS 81(5): 2229-2235.
PUB | DOI | WoS
 
[2]
1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637796
Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors
Stock HJ, Hamelmann F, Kleineberg U, Menke D, Schmiedeskamp B, Osterried K, Heidemann KF, Heinzmann U (1997)
APPLIED OPTICS 36(7): 1650-1654.
PUB | DOI | WoS | PubMed | Europe PMC
 
[1]
1996 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1638117
Thermal stability of W1-xSix/Si multilayer reflective coatings under high intensity excimer laser pulses
D'Anna E, Luches A, Martino M, Brunel M, Majkova E, Luby S, Senderak R, Jergel M, Hamelmann F, Kleineberg U, Heinzmann U (1996)
Applied Surface Science 106: 166-170.
PUB | DOI | WoS
 

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30 Publikationen

Alle markieren

[30]
2013 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2343895
Modelling of infrared optical constants for polycrystalline low pressure chemical vapour deposition ZnO:B films
Prunici P, Hamelmann F, Beyer W, Kurz H, Stiebig H (2013)
Journal of Applied Physics 113(21): 123104.
PUB | DOI | WoS
 
[29]
2009 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 2345328
Surface modification of LPCVD ZNO-Films for silicon thin film solar cells
Lükermann F, Mönkemöller V, Kurz H, Sacher M, Hamelmann F, Stiebig H, Heinzmann U (2009)
In: Proceedings of the 24th EU PVSEC. 2299-2303.
PUB | PDF | DOI
 
[28]
2009 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1589799
Electrochromic mixed films based On WO3 and MoO3, obtained by an APCVD method
Ivanova T, Gesheva KA, Kalitzova M, Hamelmann F, Lükermann F, Heinzmann U (2009)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 11(10): 1513-1516.
PUB | WoS
 
[27]
2006 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1874432
Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers
Wonisch A, Hamelmann F, Hachmann W, Heinzmann U (2006)
In: Functional Properties of Nanostructured Materials. Kassing R, Petkov P, Kulisch W, Popov C (Eds); Dordrecht: Springer: 351-354.
PUB | DOI
 
[26]
2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1601030
Plasma-assisted chemical vapor deposited silicon oxynitride as an alternative material for gate dielectric in MOS devices
Szekeres A, Nikolova T, Simeonov S, Gushterov A, Hamelmann F, Heinzmann U (2006)
MICROELECTRONICS JOURNAL 37(1): 64-70.
PUB | DOI | WoS
 
[25]
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1874437
Technology and characterization of CVD-grown mixed Mo/W oxide films and electrochromic devices made on their basis
Gesheva K, Ivanova T, Steinman E, Hamelmann F, Heinzmann U, Brechling A (2005)
In: ECS Proceedings PV 2005-09. 799-799.
PUB
 
[24]
2005 | Sammelwerksbeitrag | PUB-ID: 1874434
Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications
Ivanova T, Gesheva K, Hamelmann F, Hachmann W, Heinzmann U, Brechling A (2005)
In: ECS Proceedings; PV 2005-09. 433-433.
PUB
 
[23]
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604367
Electrical properties of plasma-assisted CVD deposited thin silicon oxynitride films
Szekeres A, Simeonov S, Gushterov A, Nikolova T, Hamelmann F, Heinzmann U (2005)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 553-556.
PUB | WoS
 
[22]
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604354
Deposition of silicon oxide thin films in TEOS with addition of oxygen to the plasma ambient: IR spectra analysis
Hamelmann F, Heinzmann U, Szekeres A, Kirov N, Nikolova T (2005)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 389-392.
PUB | WoS
 
[21]
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604360
Optical and electrochromic characterization of multilayered mixed metal oxide thin films
Hamelmann F, Gesheva K, Ivanova T, Szekeres A, Abrashev M, Heinzmann U (2005)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 393-396.
PUB | WoS
 
[20]
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1873183
Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases
Aschentrup A, Szekeres A, Gesheva K, Hamelmann F, Heinzmann U, Brechling A (2004)
Vacuum 76 76(2-3): 139-142.
PUB | DOI | WoS
 
[19]
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609015
Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition
Hamelmann F, Brechling A, Aschentrup A, Heinzmann U, Jutzi P, Sandrock J, Siemeling U, Ivanova T, Szekeres A, Gesheva K (2004)
THIN SOLID FILMS 446(2): 167-171.
PUB | DOI | WoS
 
[18]
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609091
Light-stimulated switching of azobenzene-containing self-assembled monolayers
Hamelmann F, Heinzmann U, Siemling U, Bretthauer F, der Bruggen JV (2004)
APPLIED SURFACE SCIENCE 222(1-4): 1-5.
PUB | DOI | WoS
 
[17]
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1606874
Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions
Hamelmann F, Aschentrup A, Brechling A, Heinzmann U, Gushterov A, Szekeres A, Simeonov S (2004)
Vacuum 75(4): 307-312.
PUB | DOI | WoS
 
[16]
2003 | Sammelwerksbeitrag | PUB-ID: 1882887
Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor
Hamelmann F, Brechling A, Aschentrup A, Heinzmann U, Jutzi P, Sandrock J, Siemeling U (2003)
In: Chemical Vapor Deposition CVD XVI ECS Proceedings. Allendorf M, Maury F, Teyssandier F (Eds); .
PUB
 
[15]
2001 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1616209
Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD
Hamelmann F, Aschentrup A, Schmalhorst J-M, Kleineberg U, Heinzmann U, Dittmar K, Jutzi P (2001)
JOURNAL DE PHYSIQUE IV 11(PR3): 431-436.
PUB | WoS
 
[14]
2000 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1883586
The synthesis of Cyclopentadienyl silanes and disilanes and their fragmentation under thermal CVD conditions
Klipp A, Petri SHA, Hamelmann F, Heinzmann U, Jutzi P (2000)
In: Organosilicon Chemistry from Molecules to Materials IV, eds. N.Auner,J.Weis. Auer N, Weis J (Eds); VCH Weinheim: 806-806.
PUB
 
[13]
2000 | Dissertation | PUB-ID: 2433882
Herstellung von Metall-Silizium-Multischichten mit dem MOCVD-Verfahren
Hamelmann F (2000) Berichte aus der Physik.
Aachen: Shaker.
PUB
 
[12]
2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1958189
Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films
Hamelmann F, Haindl G, Aschentrup A, Klipp A, Kleineberg U, Jutzi P, Heinzmann U (2000)
In: Chemical Vapor Deposition CVD XV, ECS Proc. PV. Allendorf MD, Besman TM (Eds); 131.
PUB
 
[11]
2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620849
Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD
Hamelmann F, Haindl G, Schmalhorst J-M, Aschentrup A, Majkova E, Kleineberg U, Heinzmann U, Klipp A, Jutzi P, Anopchenko A, Jergel M, et al. (2000)
THIN SOLID FILMS 358(1-2): 90-93.
PUB | DOI | WoS
 
[10]
2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620153
Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films
Klipp A, Hamelmann F, Haindl G, Hartwich J, Kleineberg U, Jutzi P, Heinzmann U (2000)
CHEMICAL VAPOR DEPOSITION 6(2): 63-66.
PUB | DOI | WoS
 
[9]
2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1883600
In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors
Hamelmann F, Klipp A, Petri SHA, Haindl G, Hartwich J, Kleineberg U, Jutzi P, Heinzmann U (2000)
In: Organosilicon Chemistry IV: from Molecules to Materials. Auer N, Weis J (Eds); Weinheim: Wiley-VCH: 798-798.
PUB
 
[8]
1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1622128
Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing
Luby S, Jergel M, Anopchenko A, Aschentrup A, Hamelmann F, Majkova E, Kleineberg U, Heinzmann U (1999)
APPLIED SURFACE SCIENCE 150(1-4): 178-184.
PUB | DOI | WoS
 
[7]
1999 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1622647
Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY
Kleineberg U, Menke D, Hamelmann F, Heinzmann U, Schmidt O, Fecher GH, Schoenhense G (1999)
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA 103: 931-936.
PUB | DOI | WoS
 
[6]
1999 | Zeitschriftenaufsatz | PUB-ID: 1883592
Metal/Silicon multilayers produced by low temperature MOCVD
Hamelmann F, Haindl G, Hartwich J, Klipp A, Majkova E, Kleineberg U, Jutzi P, Heinzmann U (1999)
Mater.Res.Soc.Proc. 555: 19-19.
PUB
 
[5]
1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1623447
W/Si multilayers deposited by hot-filament MOCVD
Hamelmann F, Petri SHA, Klipp A, Haindl G, Hartwich J, Dreeskornfeld L, Kleineberg U, Jutzi P, Heinzmann U (1999)
THIN SOLID FILMS 338(1-2): 70-74.
PUB | DOI | WoS
 
[4]
1998 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1624974
Carbon/titanium multilayers as soft-x-ray mirrors for the water window
Stock HJ, Haindl G, Hamelmann F, Menke D, Wehmeyer O, Kleineberg U, Heinzmann U, Bulicke P, Fuchs D, Ulm G (1998)
APPLIED OPTICS 37(25): 6002-6005.
PUB | DOI | WoS | PubMed | Europe PMC
 
[3]
1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637888
Thermal stability of W1-xSix/Si multilayers under rapid thermal annealing
Senderak R, Jergel M, Luby S, Majkova E, Holy V, Haindl G, Hamelmann F, Kleineberg U, Heinzmann U (1997)
JOURNAL OF APPLIED PHYSICS 81(5): 2229-2235.
PUB | DOI | WoS
 
[2]
1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637796
Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors
Stock HJ, Hamelmann F, Kleineberg U, Menke D, Schmiedeskamp B, Osterried K, Heidemann KF, Heinzmann U (1997)
APPLIED OPTICS 36(7): 1650-1654.
PUB | DOI | WoS | PubMed | Europe PMC
 
[1]
1996 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1638117
Thermal stability of W1-xSix/Si multilayer reflective coatings under high intensity excimer laser pulses
D'Anna E, Luches A, Martino M, Brunel M, Majkova E, Luby S, Senderak R, Jergel M, Hamelmann F, Kleineberg U, Heinzmann U (1996)
Applied Surface Science 106: 166-170.
PUB | DOI | WoS
 

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