Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications
Ivanova T, Gesheva K, Hamelmann F, Hachmann W, Heinzmann U, Brechling A (2005)
In: ECS Proceedings; PV 2005-09. 433-433.
Sammelwerksbeitrag | Englisch
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Autor*in
Ivanova, T.;
Gesheva, K.;
Hamelmann, FrankUniBi;
Hachmann, WiebkeUniBi;
Heinzmann, UlrichUniBi;
Brechling, ArminUniBi
Erscheinungsjahr
2005
Buchtitel
ECS Proceedings; PV 2005-09
Seite(n)
433-433
Page URI
https://pub.uni-bielefeld.de/record/1874434
Zitieren
Ivanova T, Gesheva K, Hamelmann F, Hachmann W, Heinzmann U, Brechling A. Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications. In: ECS Proceedings; PV 2005-09. 2005: 433-433.
Ivanova, T., Gesheva, K., Hamelmann, F., Hachmann, W., Heinzmann, U., & Brechling, A. (2005). Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications. ECS Proceedings; PV 2005-09, 433-433.
Ivanova, T., Gesheva, K., Hamelmann, Frank, Hachmann, Wiebke, Heinzmann, Ulrich, and Brechling, Armin. 2005. “Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications”. In ECS Proceedings; PV 2005-09, 433-433.
Ivanova, T., Gesheva, K., Hamelmann, F., Hachmann, W., Heinzmann, U., and Brechling, A. (2005). “Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications” in ECS Proceedings; PV 2005-09 433-433.
Ivanova, T., et al., 2005. Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications. In ECS Proceedings; PV 2005-09. pp. 433-433.
T. Ivanova, et al., “Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications”, ECS Proceedings; PV 2005-09, 2005, pp.433-433.
Ivanova, T., Gesheva, K., Hamelmann, F., Hachmann, W., Heinzmann, U., Brechling, A.: Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications. ECS Proceedings; PV 2005-09. p. 433-433. (2005).
Ivanova, T., Gesheva, K., Hamelmann, Frank, Hachmann, Wiebke, Heinzmann, Ulrich, and Brechling, Armin. “Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications”. ECS Proceedings; PV 2005-09. 2005. 433-433.
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