PUB - Publikationen an der Universität Bielefeld

Alle markieren

• [30]
  

  2013 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2343895

  P. Prunici, et al., “Modelling of infrared optical constants for polycrystalline low pressure chemical vapour deposition ZnO:B films”, Journal of Applied Physics, vol. 113, 2013, : 123104.

  PUB | DOI | WoS
   
• [29]
  

  2009 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 2345328

  F. Lükermann, et al., “Surface modification of LPCVD ZNO-Films for silicon thin film solar cells”, Proceedings of the 24th EU PVSEC, 2009, pp.2299-2303.

  PUB | PDF | DOI
   
• [28]
  

  2009 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1589799

  T. Ivanova, et al., “Electrochromic mixed films based On WO3 and MoO3, obtained by an APCVD method”, JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, vol. 11, 2009, pp. 1513-1516.

  PUB | WoS
   
• [27]
  

  2006 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1874432

  A. Wonisch, et al., “Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers”, Functional Properties of Nanostructured Materials, R. Kassing, et al., eds., Dordrecht: Springer, 2006, pp.351-354.

  PUB | DOI
   
• [26]
  

  2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1601030

  A. Szekeres, et al., “Plasma-assisted chemical vapor deposited silicon oxynitride as an alternative material for gate dielectric in MOS devices”, MICROELECTRONICS JOURNAL, vol. 37, 2006, pp. 64-70.

  PUB | DOI | WoS
   
• [25]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1874437

  K. Gesheva, et al., “Technology and characterization of CVD-grown mixed Mo/W oxide films and electrochromic devices made on their basis”, ECS Proceedings PV 2005-09, 2005, pp.799-799.

  PUB
   
• [24]
  

  2005 | Sammelwerksbeitrag | PUB-ID: 1874434

  T. Ivanova, et al., “Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications”, ECS Proceedings; PV 2005-09, 2005, pp.433-433.

  PUB
   
• [23]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604367

  A. Szekeres, et al., “Electrical properties of plasma-assisted CVD deposited thin silicon oxynitride films”, JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, vol. 7, 2005, pp. 553-556.

  PUB | WoS
   
• [22]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604354

  F. Hamelmann, et al., “Deposition of silicon oxide thin films in TEOS with addition of oxygen to the plasma ambient: IR spectra analysis”, JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, vol. 7, 2005, pp. 389-392.

  PUB | WoS
   
• [21]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604360

  F. Hamelmann, et al., “Optical and electrochromic characterization of multilayered mixed metal oxide thin films”, JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, vol. 7, 2005, pp. 393-396.

  PUB | WoS
   
• [20]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1873183

  A. Aschentrup, et al., “Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases”, Vacuum 76, vol. 76, 2004, pp. 139-142.

  PUB | DOI | WoS
   
• [19]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609091

  F. Hamelmann, et al., “Light-stimulated switching of azobenzene-containing self-assembled monolayers”, APPLIED SURFACE SCIENCE, vol. 222, 2004, pp. 1-5.

  PUB | DOI | WoS
   
• [18]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609015

  F. Hamelmann, et al., “Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition”, THIN SOLID FILMS, vol. 446, 2004, pp. 167-171.

  PUB | DOI | WoS
   
• [17]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1606874

  F. Hamelmann, et al., “Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions”, Vacuum, vol. 75, 2004, pp. 307-312.

  PUB | DOI | WoS
   
• [16]
  

  2003 | Sammelwerksbeitrag | PUB-ID: 1882887

  F. Hamelmann, et al., “Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor”, Chemical Vapor Deposition CVD XVI ECS Proceedings, M. Allendorf, F. Maury, and F. Teyssandier, eds., 2003.

  PUB
   
• [15]
  

  2001 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1616209

  F. Hamelmann, et al., “Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD”, JOURNAL DE PHYSIQUE IV, vol. 11, 2001, pp. 431-436.

  PUB | WoS
   
• [14]
  

  2000 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1883586

  A. Klipp, et al., “The synthesis of Cyclopentadienyl silanes and disilanes and their fragmentation under thermal CVD conditions”, Organosilicon Chemistry from Molecules to Materials IV, eds. N.Auner,J.Weis, N. Auer and J. Weis, eds., VCH Weinheim: VCH, 2000, pp.806-806.

  PUB
   
• [13]
  

  2000 | Dissertation | PUB-ID: 2433882

  F. Hamelmann, Herstellung von Metall-Silizium-Multischichten mit dem MOCVD-Verfahren, Berichte aus der Physik, Aachen: Shaker, 2000.

  PUB
   
• [12]
  

  2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1958189

  F. Hamelmann, et al., “Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films”, Chemical Vapor Deposition CVD XV, ECS Proc. PV, M.D. Allendorf and T.M. Besman, eds., 2000, pp.131.

  PUB
   
• [11]
  

  2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620849

  F. Hamelmann, et al., “Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD”, THIN SOLID FILMS, vol. 358, 2000, pp. 90-93.

  PUB | DOI | WoS
   
• [10]
  

  2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620153

  A. Klipp, et al., “Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films”, CHEMICAL VAPOR DEPOSITION, vol. 6, 2000, pp. 63-66.

  PUB | DOI | WoS
   
• [9]
  

  2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1883600

  F. Hamelmann, et al., “In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors”, Organosilicon Chemistry IV: from Molecules to Materials, N. Auer and J. Weis, eds., Weinheim: Wiley-VCH, 2000, pp.798-798.

  PUB
   
• [8]
  

  1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1622128

  S. Luby, et al., “Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing”, APPLIED SURFACE SCIENCE, vol. 150, 1999, pp. 178-184.

  PUB | DOI | WoS
   
• [7]
  

  1999 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1622647

  U. Kleineberg, et al., “Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY”, Journal of Electron Spectroscopy and Related Phenomena, JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, vol. 103, ELSEVIER SCIENCE BV, 1999, pp.931-936.

  PUB | DOI | WoS
   
• [6]
  

  1999 | Zeitschriftenaufsatz | PUB-ID: 1883592

  F. Hamelmann, et al., “Metal/Silicon multilayers produced by low temperature MOCVD”, Mater.Res.Soc.Proc., vol. 555, 1999, pp. 19-19.

  PUB
   
• [5]
  

  1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1623447

  F. Hamelmann, et al., “W/Si multilayers deposited by hot-filament MOCVD”, THIN SOLID FILMS, vol. 338, 1999, pp. 70-74.

  PUB | DOI | WoS
   
• [4]
  

  1998 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1624974

  H.J. Stock, et al., “Carbon/titanium multilayers as soft-x-ray mirrors for the water window”, APPLIED OPTICS, vol. 37, 1998, pp. 6002-6005.

  PUB | DOI | WoS | PubMed | Europe PMC
   
• [3]
  

  1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637888

  R. Senderak, et al., “Thermal stability of W1-xSix/Si multilayers under rapid thermal annealing”, JOURNAL OF APPLIED PHYSICS, vol. 81, 1997, pp. 2229-2235.

  PUB | DOI | WoS
   
• [2]
  

  1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637796

  H.J. Stock, et al., “Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors”, APPLIED OPTICS, vol. 36, 1997, pp. 1650-1654.

  PUB | DOI | WoS | PubMed | Europe PMC
   
• [1]
  

  1996 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1638117

  E. D'Anna, et al., “Thermal stability of W1-xSix/Si multilayer reflective coatings under high intensity excimer laser pulses”, Applied Surface Science, Applied Surface Science, vol. 106, Elsevier, 1996, pp.166-170.

  PUB | DOI | WoS