Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing

Luby S, Jergel M, Anopchenko A, Aschentrup A, Hamelmann F, Majkova E, Kleineberg U, Heinzmann U (1999)
APPLIED SURFACE SCIENCE 150(1-4): 178-184.

Zeitschriftenaufsatz | Veröffentlicht | Englisch
 
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Autor*in
Luby, S; Jergel, M; Anopchenko, A; Aschentrup, A; Hamelmann, FrankUniBi; Majkova, E; Kleineberg, U; Heinzmann, UlrichUniBi
Abstract / Bemerkung
The e-beam deposited multilayers (MLS) were studied under rapid thermal annealing (RTA) between 250 degrees C and 1000 degrees C during 39 s. MLS with five Co/Si/W/Si periods, each 13.9 nm (MLS1) and 18 nm (MLS1) were deposited onto oxidized Si substrates. Samples were analyzed by X-ray diffraction, hard and soft X-ray reflectivity measurements and grazing incidence X-ray diffuse scattering. The MLS period, interface roughness and its lateral and vertical correlations were obtained by simulation of the hard X-ray reflectivity and diffuse scattering spectra. The MLS1 with thinner Co layers is more temperature resistant. However, its soft X-ray reflectivity is smaller. The results show that this is because of shorter lateral and vertical correlation lengths of the interface roughness which may considerably influence the X-ray reflectivity of multilayers, (C) 1999 Elsevier Science B.V. All rights reserved.
Stichworte
tungsten; multilayers; silicon; cobalt; thermal stability; rapid; thermal annealing
Erscheinungsjahr
1999
Zeitschriftentitel
APPLIED SURFACE SCIENCE
Band
150
Ausgabe
1-4
Seite(n)
178-184
ISSN
0169-4332
Page URI
https://pub.uni-bielefeld.de/record/1622128

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Luby S, Jergel M, Anopchenko A, et al. Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. APPLIED SURFACE SCIENCE. 1999;150(1-4):178-184.
Luby, S., Jergel, M., Anopchenko, A., Aschentrup, A., Hamelmann, F., Majkova, E., Kleineberg, U., et al. (1999). Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. APPLIED SURFACE SCIENCE, 150(1-4), 178-184. doi:10.1016/S0169-4332(99)00243-3
Luby, S., Jergel, M., Anopchenko, A., Aschentrup, A., Hamelmann, F., Majkova, E., Kleineberg, U., and Heinzmann, U. (1999). Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. APPLIED SURFACE SCIENCE 150, 178-184.
Luby, S., et al., 1999. Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. APPLIED SURFACE SCIENCE, 150(1-4), p 178-184.
S. Luby, et al., “Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing”, APPLIED SURFACE SCIENCE, vol. 150, 1999, pp. 178-184.
Luby, S., Jergel, M., Anopchenko, A., Aschentrup, A., Hamelmann, F., Majkova, E., Kleineberg, U., Heinzmann, U.: Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. APPLIED SURFACE SCIENCE. 150, 178-184 (1999).
Luby, S, Jergel, M, Anopchenko, A, Aschentrup, A, Hamelmann, Frank, Majkova, E, Kleineberg, U, and Heinzmann, Ulrich. “Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing”. APPLIED SURFACE SCIENCE 150.1-4 (1999): 178-184.