PUB - Publikationen an der Universität Bielefeld

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• [30]
  

  2013 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2343895

  Prunici, P., Hamelmann, F., Beyer, W., Kurz, H., & Stiebig, H. (2013). Modelling of infrared optical constants for polycrystalline low pressure chemical vapour deposition ZnO:B films. Journal of Applied Physics, 113(21), 123104. https://doi.org/10.1063/1.4795809

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• [29]
  

  2009 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 2345328

  Lükermann, F., Mönkemöller, V., Kurz, H., Sacher, M., Hamelmann, F., Stiebig, H., & Heinzmann, U. (2009). Surface modification of LPCVD ZNO-Films for silicon thin film solar cells. Proceedings of the 24th EU PVSEC, 2299-2303. https://doi.org/10.4229/24thEUPVSEC2009-3BO.9.4

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• [28]
  

  2009 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1589799

  Ivanova, T., Gesheva, K. A., Kalitzova, M., Hamelmann, F., Lükermann, F., & Heinzmann, U. (2009). Electrochromic mixed films based On WO3 and MoO3, obtained by an APCVD method. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 11(10), 1513-1516.

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• [27]
  

  2006 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1874432

  Wonisch, A., Hamelmann, F., Hachmann, W., & Heinzmann, U. (2006). Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers. In R. Kassing, P. Petkov, W. Kulisch, & C. Popov (Eds.), Functional Properties of Nanostructured Materials (pp. 351-354). Dordrecht: Springer. https://doi.org/10.1007/1-4020-4594-8_27

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• [26]
  

  2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1601030

  Szekeres, A., Nikolova, T., Simeonov, S., Gushterov, A., Hamelmann, F., & Heinzmann, U. (2006). Plasma-assisted chemical vapor deposited silicon oxynitride as an alternative material for gate dielectric in MOS devices. MICROELECTRONICS JOURNAL, 37(1), 64-70. https://doi.org/10.1016/j.mejo.2005.06.013

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• [25]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1874437

  Gesheva, K., Ivanova, T., Steinman, E., Hamelmann, F., Heinzmann, U., & Brechling, A. (2005). Technology and characterization of CVD-grown mixed Mo/W oxide films and electrochromic devices made on their basis. ECS Proceedings PV 2005-09, 799-799.

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• [24]
  

  2005 | Sammelwerksbeitrag | PUB-ID: 1874434

  Ivanova, T., Gesheva, K., Hamelmann, F., Hachmann, W., Heinzmann, U., & Brechling, A. (2005). Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications. ECS Proceedings; PV 2005-09, 433-433.

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• [23]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604367

  Szekeres, A., Simeonov, S., Gushterov, A., Nikolova, T., Hamelmann, F., & Heinzmann, U. (2005). Electrical properties of plasma-assisted CVD deposited thin silicon oxynitride films. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 7(1), 553-556.

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• [22]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604354

  Hamelmann, F., Heinzmann, U., Szekeres, A., Kirov, N., & Nikolova, T. (2005). Deposition of silicon oxide thin films in TEOS with addition of oxygen to the plasma ambient: IR spectra analysis. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 7(1), 389-392.

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• [21]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604360

  Hamelmann, F., Gesheva, K., Ivanova, T., Szekeres, A., Abrashev, M., & Heinzmann, U. (2005). Optical and electrochromic characterization of multilayered mixed metal oxide thin films. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 7(1), 393-396.

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• [20]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1873183

  Aschentrup, A., Szekeres, A., Gesheva, K., Hamelmann, F., Heinzmann, U., & Brechling, A. (2004). Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76, 76(2-3), 139-142. https://doi.org/10.1016/j.vacuum.2004.07.074

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• [19]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609091

  Hamelmann, F., Heinzmann, U., Siemling, U., Bretthauer, F., & der Bruggen, J. V. (2004). Light-stimulated switching of azobenzene-containing self-assembled monolayers. APPLIED SURFACE SCIENCE, 222(1-4), 1-5. https://doi.org/10.1016/j.apsusc.2003.08.006

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• [18]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609015

  Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., Siemeling, U., et al. (2004). Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. THIN SOLID FILMS, 446(2), 167-171. https://doi.org/10.1016/j.tsf.2003.09.045

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• [17]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1606874

  Hamelmann, F., Aschentrup, A., Brechling, A., Heinzmann, U., Gushterov, A., Szekeres, A., & Simeonov, S. (2004). Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. Vacuum, 75(4), 307-312. https://doi.org/10.1016/j.vacuum.2004.03.012

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• [16]
  

  2003 | Sammelwerksbeitrag | PUB-ID: 1882887

  Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., & Siemeling, U. (2003). Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In M. Allendorf, F. Maury, & F. Teyssandier (Eds.), Chemical Vapor Deposition CVD XVI ECS Proceedings

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• [15]
  

  2001 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1616209

  Hamelmann, F., Aschentrup, A., Schmalhorst, J. - M., Kleineberg, U., Heinzmann, U., Dittmar, K., & Jutzi, P. (2001). Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD. JOURNAL DE PHYSIQUE IV, 11(PR3), 431-436.

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• [14]
  

  2000 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1883586

  Klipp, A., Petri, S. H. A., Hamelmann, F., Heinzmann, U., & Jutzi, P. (2000). The synthesis of Cyclopentadienyl silanes and disilanes and their fragmentation under thermal CVD conditions. In N. Auer & J. Weis (Eds.), Organosilicon Chemistry from Molecules to Materials IV, eds. N.Auner,J.Weis (pp. 806-806). VCH Weinheim: VCH.

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• [13]
  

  2000 | Dissertation | PUB-ID: 2433882

  Hamelmann, F. (2000). Herstellung von Metall-Silizium-Multischichten mit dem MOCVD-Verfahren (Berichte aus der Physik). Aachen: Shaker.

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• [12]
  

  2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1958189

  Hamelmann, F., Haindl, G., Aschentrup, A., Klipp, A., Kleineberg, U., Jutzi, P., & Heinzmann, U. (2000). Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films. In M. D. Allendorf & T. M. Besman (Eds.), Chemical Vapor Deposition CVD XV, ECS Proc. PV (p. 131).

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• [11]
  

  2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620849

  Hamelmann, F., Haindl, G., Schmalhorst, J. - M., Aschentrup, A., Majkova, E., Kleineberg, U., Heinzmann, U., et al. (2000). Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. THIN SOLID FILMS, 358(1-2), 90-93. https://doi.org/10.1016/S0040-6090(99)00695-1

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• [10]
  

  2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620153

  Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., & Heinzmann, U. (2000). Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films. CHEMICAL VAPOR DEPOSITION, 6(2), 63-66. https://doi.org/10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q

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• [9]
  

  2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1883600

  Hamelmann, F., Klipp, A., Petri, S. H. A., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., et al. (2000). In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors. In N. Auer & J. Weis (Eds.), Organosilicon Chemistry IV: from Molecules to Materials (pp. 798-798). Weinheim: Wiley-VCH.

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• [8]
  

  1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1622128

  Luby, S., Jergel, M., Anopchenko, A., Aschentrup, A., Hamelmann, F., Majkova, E., Kleineberg, U., et al. (1999). Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. APPLIED SURFACE SCIENCE, 150(1-4), 178-184. https://doi.org/10.1016/S0169-4332(99)00243-3

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• [7]
  

  1999 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1622647

  Kleineberg, U., Menke, D., Hamelmann, F., Heinzmann, U., Schmidt, O., Fecher, G. H., & Schoenhense, G. (1999). Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY. Journal of Electron Spectroscopy and Related Phenomena, JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 103, 931-936. ELSEVIER SCIENCE BV. https://doi.org/10.1016/S0368-2048(98)00374-0

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• [6]
  

  1999 | Zeitschriftenaufsatz | PUB-ID: 1883592

  Hamelmann, F., Haindl, G., Hartwich, J., Klipp, A., Majkova, E., Kleineberg, U., Jutzi, P., et al. (1999). Metal/Silicon multilayers produced by low temperature MOCVD. Mater.Res.Soc.Proc., 555, 19-19.

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• [5]
  

  1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1623447

  Hamelmann, F., Petri, S. H. A., Klipp, A., Haindl, G., Hartwich, J., Dreeskornfeld, L., Kleineberg, U., et al. (1999). W/Si multilayers deposited by hot-filament MOCVD. THIN SOLID FILMS, 338(1-2), 70-74. https://doi.org/10.1016/S0040-6090(98)00996-1

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• [4]
  

  1998 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1624974

  Stock, H. J., Haindl, G., Hamelmann, F., Menke, D., Wehmeyer, O., Kleineberg, U., Heinzmann, U., et al. (1998). Carbon/titanium multilayers as soft-x-ray mirrors for the water window. APPLIED OPTICS, 37(25), 6002-6005. https://doi.org/10.1364/AO.37.006002

  PUB | DOI | WoS | PubMed | Europe PMC
   
• [3]
  

  1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637888

  Senderak, R., Jergel, M., Luby, S., Majkova, E., Holy, V., Haindl, G., Hamelmann, F., et al. (1997). Thermal stability of W1-xSix/Si multilayers under rapid thermal annealing. JOURNAL OF APPLIED PHYSICS, 81(5), 2229-2235. https://doi.org/10.1063/1.364273

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• [2]
  

  1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637796

  Stock, H. J., Hamelmann, F., Kleineberg, U., Menke, D., Schmiedeskamp, B., Osterried, K., Heidemann, K. F., et al. (1997). Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors. APPLIED OPTICS, 36(7), 1650-1654. https://doi.org/10.1364/AO.36.001650

  PUB | DOI | WoS | PubMed | Europe PMC
   
• [1]
  

  1996 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1638117

  D'Anna, E., Luches, A., Martino, M., Brunel, M., Majkova, E., Luby, S., Senderak, R., et al. (1996). Thermal stability of W1-xSix/Si multilayer reflective coatings under high intensity excimer laser pulses. Applied Surface Science, Applied Surface Science, 106, 166-170. Elsevier. https://doi.org/10.1016/S0169-4332(96)00365-0

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