Frank Hamelmann
PEVZ-ID
30 Publikationen
-
2013 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2343895Prunici, P., Hamelmann, F., Beyer, W., Kurz, H., Stiebig, H.: Modelling of infrared optical constants for polycrystalline low pressure chemical vapour deposition ZnO:B films. Journal of Applied Physics. 113, : 123104 (2013).PUB | DOI | WoS
-
2009 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 2345328Lükermann, F., Mönkemöller, V., Kurz, H., Sacher, M., Hamelmann, F., Stiebig, H., Heinzmann, U.: Surface modification of LPCVD ZNO-Films for silicon thin film solar cells. Proceedings of the 24th EU PVSEC. p. 2299-2303. (2009).PUB | PDF | DOI
-
2009 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1589799Ivanova, T., Gesheva, K.A., Kalitzova, M., Hamelmann, F., Lükermann, F., Heinzmann, U.: Electrochromic mixed films based On WO3 and MoO3, obtained by an APCVD method. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS. 11, 1513-1516 (2009).PUB | WoS
-
2006 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1874432Wonisch, A., Hamelmann, F., Hachmann, W., Heinzmann, U.: Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers. In: Kassing, R., Petkov, P., Kulisch, W., and Popov, C. (eds.) Functional Properties of Nanostructured Materials. p. 351-354. Springer, Dordrecht (2006).PUB | DOI
-
2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1601030Szekeres, A., Nikolova, T., Simeonov, S., Gushterov, A., Hamelmann, F., Heinzmann, U.: Plasma-assisted chemical vapor deposited silicon oxynitride as an alternative material for gate dielectric in MOS devices. MICROELECTRONICS JOURNAL. 37, 64-70 (2006).PUB | DOI | WoS
-
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1874437Gesheva, K., Ivanova, T., Steinman, E., Hamelmann, F., Heinzmann, U., Brechling, A.: Technology and characterization of CVD-grown mixed Mo/W oxide films and electrochromic devices made on their basis. ECS Proceedings PV 2005-09. p. 799-799. (2005).PUB
-
2005 | Sammelwerksbeitrag | PUB-ID: 1874434Ivanova, T., Gesheva, K., Hamelmann, F., Hachmann, W., Heinzmann, U., Brechling, A.: Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications. ECS Proceedings; PV 2005-09. p. 433-433. (2005).PUB
-
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604367Szekeres, A., Simeonov, S., Gushterov, A., Nikolova, T., Hamelmann, F., Heinzmann, U.: Electrical properties of plasma-assisted CVD deposited thin silicon oxynitride films. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS. 7, 553-556 (2005).PUB | WoS
-
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604354Hamelmann, F., Heinzmann, U., Szekeres, A., Kirov, N., Nikolova, T.: Deposition of silicon oxide thin films in TEOS with addition of oxygen to the plasma ambient: IR spectra analysis. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS. 7, 389-392 (2005).PUB | WoS
-
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604360Hamelmann, F., Gesheva, K., Ivanova, T., Szekeres, A., Abrashev, M., Heinzmann, U.: Optical and electrochromic characterization of multilayered mixed metal oxide thin films. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS. 7, 393-396 (2005).PUB | WoS
-
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1873183Aschentrup, A., Szekeres, A., Gesheva, K., Hamelmann, F., Heinzmann, U., Brechling, A.: Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76. 76, 139-142 (2004).PUB | DOI | WoS
-
-
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609015Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., Siemeling, U., Ivanova, T., Szekeres, A., Gesheva, K.: Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. THIN SOLID FILMS. 446, 167-171 (2004).PUB | DOI | WoS
-
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1606874Hamelmann, F., Aschentrup, A., Brechling, A., Heinzmann, U., Gushterov, A., Szekeres, A., Simeonov, S.: Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. Vacuum. 75, 307-312 (2004).PUB | DOI | WoS
-
2003 | Sammelwerksbeitrag | PUB-ID: 1882887Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., Siemeling, U.: Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In: Allendorf, M., Maury, F., and Teyssandier, F. (eds.) Chemical Vapor Deposition CVD XVI ECS Proceedings. (2003).PUB
-
-
2000 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1883586Klipp, A., Petri, S.H.A., Hamelmann, F., Heinzmann, U., Jutzi, P.: The synthesis of Cyclopentadienyl silanes and disilanes and their fragmentation under thermal CVD conditions. In: Auer, N. and Weis, J. (eds.) Organosilicon Chemistry from Molecules to Materials IV, eds. N.Auner,J.Weis. p. 806-806. VCH, VCH Weinheim (2000).PUB
-
2000 | Dissertation | PUB-ID: 2433882Hamelmann, F.: Herstellung von Metall-Silizium-Multischichten mit dem MOCVD-Verfahren. Berichte aus der Physik. Shaker, Aachen (2000).PUB
-
2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1958189Hamelmann, F., Haindl, G., Aschentrup, A., Klipp, A., Kleineberg, U., Jutzi, P., Heinzmann, U.: Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films. In: Allendorf, M.D. and Besman, T.M. (eds.) Chemical Vapor Deposition CVD XV, ECS Proc. PV. p. 131. (2000).PUB
-
2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620849Hamelmann, F., Haindl, G., Schmalhorst, J.-M., Aschentrup, A., Majkova, E., Kleineberg, U., Heinzmann, U., Klipp, A., Jutzi, P., Anopchenko, A., Jergel, M., Luby, S.: Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. THIN SOLID FILMS. 358, 90-93 (2000).PUB | DOI | WoS
-
2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620153Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., Heinzmann, U.: Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films. CHEMICAL VAPOR DEPOSITION. 6, 63-66 (2000).PUB | DOI | WoS
-
2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1883600Hamelmann, F., Klipp, A., Petri, S.H.A., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., Heinzmann, U.: In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors. In: Auer, N. and Weis, J. (eds.) Organosilicon Chemistry IV: from Molecules to Materials. p. 798-798. Wiley-VCH, Weinheim (2000).PUB
-
1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1622128Luby, S., Jergel, M., Anopchenko, A., Aschentrup, A., Hamelmann, F., Majkova, E., Kleineberg, U., Heinzmann, U.: Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. APPLIED SURFACE SCIENCE. 150, 178-184 (1999).PUB | DOI | WoS
-
1999 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1622647Kleineberg, U., Menke, D., Hamelmann, F., Heinzmann, U., Schmidt, O., Fecher, G.H., Schoenhense, G.: Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY. Journal of Electron Spectroscopy and Related Phenomena. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA. 103, p. 931-936. ELSEVIER SCIENCE BV (1999).PUB | DOI | WoS
-
1999 | Zeitschriftenaufsatz | PUB-ID: 1883592Hamelmann, F., Haindl, G., Hartwich, J., Klipp, A., Majkova, E., Kleineberg, U., Jutzi, P., Heinzmann, U.: Metal/Silicon multilayers produced by low temperature MOCVD. Mater.Res.Soc.Proc. 555, 19-19 (1999).PUB
-
-
1998 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1624974Stock, H.J., Haindl, G., Hamelmann, F., Menke, D., Wehmeyer, O., Kleineberg, U., Heinzmann, U., Bulicke, P., Fuchs, D., Ulm, G.: Carbon/titanium multilayers as soft-x-ray mirrors for the water window. APPLIED OPTICS. 37, 6002-6005 (1998).PUB | DOI | WoS | PubMed | Europe PMC
-
1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637888Senderak, R., Jergel, M., Luby, S., Majkova, E., Holy, V., Haindl, G., Hamelmann, F., Kleineberg, U., Heinzmann, U.: Thermal stability of W1-xSix/Si multilayers under rapid thermal annealing. JOURNAL OF APPLIED PHYSICS. 81, 2229-2235 (1997).PUB | DOI | WoS
-
1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637796Stock, H.J., Hamelmann, F., Kleineberg, U., Menke, D., Schmiedeskamp, B., Osterried, K., Heidemann, K.F., Heinzmann, U.: Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors. APPLIED OPTICS. 36, 1650-1654 (1997).PUB | DOI | WoS | PubMed | Europe PMC
-
1996 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1638117D'Anna, E., Luches, A., Martino, M., Brunel, M., Majkova, E., Luby, S., Senderak, R., Jergel, M., Hamelmann, F., Kleineberg, U., Heinzmann, U.: Thermal stability of W1-xSix/Si multilayer reflective coatings under high intensity excimer laser pulses. Applied Surface Science. Applied Surface Science. 106, p. 166-170. Elsevier (1996).PUB | DOI | WoS