Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases
Aschentrup A, Szekeres A, Gesheva K, Hamelmann F, Heinzmann U, Brechling A (2004)
Vacuum 76 76(2-3): 139-142.
Zeitschriftenaufsatz
| Veröffentlicht | Englisch
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Autor*in
Aschentrup, Andreas;
Szekeres, A.;
Gesheva, K.;
Hamelmann, FrankUniBi;
Heinzmann, UlrichUniBi;
Brechling, ArminUniBi
Einrichtung
Erscheinungsjahr
2004
Zeitschriftentitel
Vacuum 76
Band
76
Ausgabe
2-3
Seite(n)
139-142
ISSN
0042-207X
Page URI
https://pub.uni-bielefeld.de/record/1873183
Zitieren
Aschentrup A, Szekeres A, Gesheva K, Hamelmann F, Heinzmann U, Brechling A. Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76. 2004;76(2-3):139-142.
Aschentrup, A., Szekeres, A., Gesheva, K., Hamelmann, F., Heinzmann, U., & Brechling, A. (2004). Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76, 76(2-3), 139-142. https://doi.org/10.1016/j.vacuum.2004.07.074
Aschentrup, Andreas, Szekeres, A., Gesheva, K., Hamelmann, Frank, Heinzmann, Ulrich, and Brechling, Armin. 2004. “Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases”. Vacuum 76 76 (2-3): 139-142.
Aschentrup, A., Szekeres, A., Gesheva, K., Hamelmann, F., Heinzmann, U., and Brechling, A. (2004). Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76 76, 139-142.
Aschentrup, A., et al., 2004. Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76, 76(2-3), p 139-142.
A. Aschentrup, et al., “Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases”, Vacuum 76, vol. 76, 2004, pp. 139-142.
Aschentrup, A., Szekeres, A., Gesheva, K., Hamelmann, F., Heinzmann, U., Brechling, A.: Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76. 76, 139-142 (2004).
Aschentrup, Andreas, Szekeres, A., Gesheva, K., Hamelmann, Frank, Heinzmann, Ulrich, and Brechling, Armin. “Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases”. Vacuum 76 76.2-3 (2004): 139-142.
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