Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers
Wonisch A, Hamelmann F, Hachmann W, Heinzmann U (2006)
In: Functional Properties of Nanostructured Materials. Kassing R, Petkov P, Kulisch W, Popov C (Eds); Dordrecht: Springer: 351-354.
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| Veröffentlicht | Englisch
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Autor*in
Herausgeber*in
Kassing, Rainer;
Petkov, Plamen;
Kulisch, Wilhelm;
Popov, Cyril
Erscheinungsjahr
2006
Buchtitel
Functional Properties of Nanostructured Materials
Seite(n)
351-354
ISBN
978-1-4020-4595-0
Page URI
https://pub.uni-bielefeld.de/record/1874432
Zitieren
Wonisch A, Hamelmann F, Hachmann W, Heinzmann U. Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers. In: Kassing R, Petkov P, Kulisch W, Popov C, eds. Functional Properties of Nanostructured Materials. Dordrecht: Springer; 2006: 351-354.
Wonisch, A., Hamelmann, F., Hachmann, W., & Heinzmann, U. (2006). Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers. In R. Kassing, P. Petkov, W. Kulisch, & C. Popov (Eds.), Functional Properties of Nanostructured Materials (pp. 351-354). Dordrecht: Springer. https://doi.org/10.1007/1-4020-4594-8_27
Wonisch, Andreas, Hamelmann, Frank, Hachmann, Wiebke, and Heinzmann, Ulrich. 2006. “Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers”. In Functional Properties of Nanostructured Materials, ed. Rainer Kassing, Plamen Petkov, Wilhelm Kulisch, and Cyril Popov, 351-354. Dordrecht: Springer.
Wonisch, A., Hamelmann, F., Hachmann, W., and Heinzmann, U. (2006). “Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers” in Functional Properties of Nanostructured Materials, Kassing, R., Petkov, P., Kulisch, W., and Popov, C. eds. (Dordrecht: Springer), 351-354.
Wonisch, A., et al., 2006. Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers. In R. Kassing, et al., eds. Functional Properties of Nanostructured Materials. Dordrecht: Springer, pp. 351-354.
A. Wonisch, et al., “Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers”, Functional Properties of Nanostructured Materials, R. Kassing, et al., eds., Dordrecht: Springer, 2006, pp.351-354.
Wonisch, A., Hamelmann, F., Hachmann, W., Heinzmann, U.: Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers. In: Kassing, R., Petkov, P., Kulisch, W., and Popov, C. (eds.) Functional Properties of Nanostructured Materials. p. 351-354. Springer, Dordrecht (2006).
Wonisch, Andreas, Hamelmann, Frank, Hachmann, Wiebke, and Heinzmann, Ulrich. “Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers”. Functional Properties of Nanostructured Materials. Ed. Rainer Kassing, Plamen Petkov, Wilhelm Kulisch, and Cyril Popov. Dordrecht: Springer, 2006. 351-354.
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