PUB - Publikationen an der Universität Bielefeld

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• [30]
  

  2013 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2343895

  Prunici, P., et al., 2013. Modelling of infrared optical constants for polycrystalline low pressure chemical vapour deposition ZnO:B films. Journal of Applied Physics, 113(21): 123104.

  PUB | DOI | WoS
   
• [29]
  

  2009 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 2345328

  Lükermann, F., et al., 2009. Surface modification of LPCVD ZNO-Films for silicon thin film solar cells. In Proceedings of the 24th EU PVSEC. pp. 2299-2303.

  PUB | PDF | DOI
   
• [28]
  

  2009 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1589799

  Ivanova, T., et al., 2009. Electrochromic mixed films based On WO3 and MoO3, obtained by an APCVD method. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 11(10), p 1513-1516.

  PUB | WoS
   
• [27]
  

  2006 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1874432

  Wonisch, A., et al., 2006. Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers. In R. Kassing, et al., eds. Functional Properties of Nanostructured Materials. Dordrecht: Springer, pp. 351-354.

  PUB | DOI
   
• [26]
  

  2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1601030

  Szekeres, A., et al., 2006. Plasma-assisted chemical vapor deposited silicon oxynitride as an alternative material for gate dielectric in MOS devices. MICROELECTRONICS JOURNAL, 37(1), p 64-70.

  PUB | DOI | WoS
   
• [25]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1874437

  Gesheva, K., et al., 2005. Technology and characterization of CVD-grown mixed Mo/W oxide films and electrochromic devices made on their basis. In ECS Proceedings PV 2005-09. pp. 799-799.

  PUB
   
• [24]
  

  2005 | Sammelwerksbeitrag | PUB-ID: 1874434

  Ivanova, T., et al., 2005. Plasma enhanced MOCVD of transition metal oxide thin films with a thickness between some hundred and less than one nanometer for optical applications. In ECS Proceedings; PV 2005-09. pp. 433-433.

  PUB
   
• [23]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604367

  Szekeres, A., et al., 2005. Electrical properties of plasma-assisted CVD deposited thin silicon oxynitride films. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 7(1), p 553-556.

  PUB | WoS
   
• [22]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604354

  Hamelmann, F., et al., 2005. Deposition of silicon oxide thin films in TEOS with addition of oxygen to the plasma ambient: IR spectra analysis. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 7(1), p 389-392.

  PUB | WoS
   
• [21]
  

  2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604360

  Hamelmann, F., et al., 2005. Optical and electrochromic characterization of multilayered mixed metal oxide thin films. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 7(1), p 393-396.

  PUB | WoS
   
• [20]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1873183

  Aschentrup, A., et al., 2004. Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76, 76(2-3), p 139-142.

  PUB | DOI | WoS
   
• [19]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609091

  Hamelmann, F., et al., 2004. Light-stimulated switching of azobenzene-containing self-assembled monolayers. APPLIED SURFACE SCIENCE, 222(1-4), p 1-5.

  PUB | DOI | WoS
   
• [18]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1609015

  Hamelmann, F., et al., 2004. Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. THIN SOLID FILMS, 446(2), p 167-171.

  PUB | DOI | WoS
   
• [17]
  

  2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1606874

  Hamelmann, F., et al., 2004. Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. Vacuum, 75(4), p 307-312.

  PUB | DOI | WoS
   
• [16]
  

  2003 | Sammelwerksbeitrag | PUB-ID: 1882887

  Hamelmann, F., et al., 2003. Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In M. Allendorf, F. Maury, & F. Teyssandier, eds. Chemical Vapor Deposition CVD XVI ECS Proceedings.

  PUB
   
• [15]
  

  2001 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1616209

  Hamelmann, F., et al., 2001. Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD. JOURNAL DE PHYSIQUE IV, 11(PR3), p 431-436.

  PUB | WoS
   
• [14]
  

  2000 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1883586

  Klipp, A., et al., 2000. The synthesis of Cyclopentadienyl silanes and disilanes and their fragmentation under thermal CVD conditions. In N. Auer & J. Weis, eds. Organosilicon Chemistry from Molecules to Materials IV, eds. N.Auner,J.Weis. VCH Weinheim: VCH, pp. 806-806.

  PUB
   
• [13]
  

  2000 | Dissertation | PUB-ID: 2433882

  Hamelmann, F., 2000. Herstellung von Metall-Silizium-Multischichten mit dem MOCVD-Verfahren, Berichte aus der Physik, Aachen: Shaker.

  PUB
   
• [12]
  

  2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1958189

  Hamelmann, F., et al., 2000. Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films. In M. D. Allendorf & T. M. Besman, eds. Chemical Vapor Deposition CVD XV, ECS Proc. PV. pp. 131.

  PUB
   
• [11]
  

  2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620849

  Hamelmann, F., et al., 2000. Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. THIN SOLID FILMS, 358(1-2), p 90-93.

  PUB | DOI | WoS
   
• [10]
  

  2000 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1620153

  Klipp, A., et al., 2000. Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films. CHEMICAL VAPOR DEPOSITION, 6(2), p 63-66.

  PUB | DOI | WoS
   
• [9]
  

  2000 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1883600

  Hamelmann, F., et al., 2000. In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors. In N. Auer & J. Weis, eds. Organosilicon Chemistry IV: from Molecules to Materials. Weinheim: Wiley-VCH, pp. 798-798.

  PUB
   
• [8]
  

  1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1622128

  Luby, S., et al., 1999. Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. APPLIED SURFACE SCIENCE, 150(1-4), p 178-184.

  PUB | DOI | WoS
   
• [7]
  

  1999 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1622647

  Kleineberg, U., et al., 1999. Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY. In Journal of Electron Spectroscopy and Related Phenomena. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA. no.103 ELSEVIER SCIENCE BV, pp. 931-936.

  PUB | DOI | WoS
   
• [6]
  

  1999 | Zeitschriftenaufsatz | PUB-ID: 1883592

  Hamelmann, F., et al., 1999. Metal/Silicon multilayers produced by low temperature MOCVD. Mater.Res.Soc.Proc., 555, p 19-19.

  PUB
   
• [5]
  

  1999 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1623447

  Hamelmann, F., et al., 1999. W/Si multilayers deposited by hot-filament MOCVD. THIN SOLID FILMS, 338(1-2), p 70-74.

  PUB | DOI | WoS
   
• [4]
  

  1998 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1624974

  Stock, H.J., et al., 1998. Carbon/titanium multilayers as soft-x-ray mirrors for the water window. APPLIED OPTICS, 37(25), p 6002-6005.

  PUB | DOI | WoS | PubMed | Europe PMC
   
• [3]
  

  1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637888

  Senderak, R., et al., 1997. Thermal stability of W1-xSix/Si multilayers under rapid thermal annealing. JOURNAL OF APPLIED PHYSICS, 81(5), p 2229-2235.

  PUB | DOI | WoS
   
• [2]
  

  1997 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1637796

  Stock, H.J., et al., 1997. Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum/silicon multilayer soft-x-ray mirrors. APPLIED OPTICS, 36(7), p 1650-1654.

  PUB | DOI | WoS | PubMed | Europe PMC
   
• [1]
  

  1996 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1638117

  D'Anna, E., et al., 1996. Thermal stability of W1-xSix/Si multilayer reflective coatings under high intensity excimer laser pulses. In Applied Surface Science. Applied Surface Science. no.106 Elsevier, pp. 166-170.

  PUB | DOI | WoS