Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition

Hamelmann F, Brechling A, Aschentrup A, Heinzmann U, Jutzi P, Sandrock J, Siemeling U, Ivanova T, Szekeres A, Gesheva K (2004)
THIN SOLID FILMS 446(2): 167-171.

Zeitschriftenaufsatz | Veröffentlicht | Englisch
 
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Abstract / Bemerkung
Molybdenum oxide thin films were prepared by plasma-enhanced chemical vapor deposition of molybdenum pentacarbonyl 1-methylbutylisonitrile. This precursor is an interesting alternative for the commonly used molybdenum hexacarbonyl, because the substance is liquid at room temperature, offers sufficient volatility and stability to air and water. The film growth was monitored in situ by a soft X-ray reflectivity measurement. The films were deposited with different plasma gases (hydrogen and oxygen) under different conditions and analysed by Auger electron spectroscopy, X-ray diffraction and spectral ellipsometry. (C) 2003 Elsevier B.V All rights reserved.
Stichworte
deposition; molybdenum oxide; plasma processing and; electrochromic films; chemical vapor deposition
Erscheinungsjahr
2004
Zeitschriftentitel
THIN SOLID FILMS
Band
446
Ausgabe
2
Seite(n)
167-171
ISSN
0040-6090
Page URI
https://pub.uni-bielefeld.de/record/1609015

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Hamelmann F, Brechling A, Aschentrup A, et al. Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. THIN SOLID FILMS. 2004;446(2):167-171.
Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., Siemeling, U., et al. (2004). Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. THIN SOLID FILMS, 446(2), 167-171. doi:10.1016/j.tsf.2003.09.045
Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., Siemeling, U., Ivanova, T., Szekeres, A., and Gesheva, K. (2004). Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. THIN SOLID FILMS 446, 167-171.
Hamelmann, F., et al., 2004. Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. THIN SOLID FILMS, 446(2), p 167-171.
F. Hamelmann, et al., “Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition”, THIN SOLID FILMS, vol. 446, 2004, pp. 167-171.
Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., Siemeling, U., Ivanova, T., Szekeres, A., Gesheva, K.: Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. THIN SOLID FILMS. 446, 167-171 (2004).
Hamelmann, Frank, Brechling, Armin, Aschentrup, A, Heinzmann, Ulrich, Jutzi, Peter, Sandrock, J, Siemeling, U, Ivanova, T, Szekeres, A, and Gesheva, K. “Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition”. THIN SOLID FILMS 446.2 (2004): 167-171.