Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films
Hamelmann F, Haindl G, Aschentrup A, Klipp A, Kleineberg U, Jutzi P, Heinzmann U (2000)
In: Chemical Vapor Deposition CVD XV, ECS Proc. PV. Allendorf MD, Besman TM (Eds); 131.
Konferenzbeitrag
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Autor*in
Hamelmann, FrankUniBi;
Haindl, G.;
Aschentrup, A.;
Klipp, A.;
Kleineberg, U.;
Jutzi, PeterUniBi;
Heinzmann, UlrichUniBi
Herausgeber*in
Allendorf, M.D.;
Besman, T.M.
Erscheinungsjahr
2000
Titel des Konferenzbandes
Chemical Vapor Deposition CVD XV, ECS Proc. PV
Seite(n)
131
Konferenz
Chemical Vapor Deposition CVD XV
Page URI
https://pub.uni-bielefeld.de/record/1958189
Zitieren
Hamelmann F, Haindl G, Aschentrup A, et al. Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films. In: Allendorf MD, Besman TM, eds. Chemical Vapor Deposition CVD XV, ECS Proc. PV. 2000: 131.
Hamelmann, F., Haindl, G., Aschentrup, A., Klipp, A., Kleineberg, U., Jutzi, P., & Heinzmann, U. (2000). Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films. In M. D. Allendorf & T. M. Besman (Eds.), Chemical Vapor Deposition CVD XV, ECS Proc. PV (p. 131).
Hamelmann, Frank, Haindl, G., Aschentrup, A., Klipp, A., Kleineberg, U., Jutzi, Peter, and Heinzmann, Ulrich. 2000. “Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films”. In Chemical Vapor Deposition CVD XV, ECS Proc. PV, ed. M.D. Allendorf and T.M. Besman, 131.
Hamelmann, F., Haindl, G., Aschentrup, A., Klipp, A., Kleineberg, U., Jutzi, P., and Heinzmann, U. (2000). “Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films” in Chemical Vapor Deposition CVD XV, ECS Proc. PV, Allendorf, M. D., and Besman, T. M. eds. 131.
Hamelmann, F., et al., 2000. Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films. In M. D. Allendorf & T. M. Besman, eds. Chemical Vapor Deposition CVD XV, ECS Proc. PV. pp. 131.
F. Hamelmann, et al., “Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films”, Chemical Vapor Deposition CVD XV, ECS Proc. PV, M.D. Allendorf and T.M. Besman, eds., 2000, pp.131.
Hamelmann, F., Haindl, G., Aschentrup, A., Klipp, A., Kleineberg, U., Jutzi, P., Heinzmann, U.: Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films. In: Allendorf, M.D. and Besman, T.M. (eds.) Chemical Vapor Deposition CVD XV, ECS Proc. PV. p. 131. (2000).
Hamelmann, Frank, Haindl, G., Aschentrup, A., Klipp, A., Kleineberg, U., Jutzi, Peter, and Heinzmann, Ulrich. “Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films”. Chemical Vapor Deposition CVD XV, ECS Proc. PV. Ed. M.D. Allendorf and T.M. Besman. 2000. 131.
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