Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor
Hamelmann F, Brechling A, Aschentrup A, Heinzmann U, Jutzi P, Sandrock J, Siemeling U (2003)
In: Chemical Vapor Deposition CVD XVI ECS Proceedings. Allendorf M, Maury F, Teyssandier F (Eds); .
Sammelwerksbeitrag | Englisch
Download
Es wurden keine Dateien hochgeladen. Nur Publikationsnachweis!
Autor*in
Hamelmann, FrankUniBi;
Brechling, ArminUniBi;
Aschentrup, A;
Heinzmann, UlrichUniBi;
Jutzi, PeterUniBi;
Sandrock, J;
Siemeling, U
Herausgeber*in
Allendorf, M;
Maury, F;
Teyssandier, F
Erscheinungsjahr
2003
Buchtitel
Chemical Vapor Deposition CVD XVI ECS Proceedings
Page URI
https://pub.uni-bielefeld.de/record/1882887
Zitieren
Hamelmann F, Brechling A, Aschentrup A, et al. Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In: Allendorf M, Maury F, Teyssandier F, eds. Chemical Vapor Deposition CVD XVI ECS Proceedings. 2003.
Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., & Siemeling, U. (2003). Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In M. Allendorf, F. Maury, & F. Teyssandier (Eds.), Chemical Vapor Deposition CVD XVI ECS Proceedings
Hamelmann, Frank, Brechling, Armin, Aschentrup, A, Heinzmann, Ulrich, Jutzi, Peter, Sandrock, J, and Siemeling, U. 2003. “Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor”. In Chemical Vapor Deposition CVD XVI ECS Proceedings, ed. M Allendorf, F Maury, and F Teyssandier.
Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., and Siemeling, U. (2003). “Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor” in Chemical Vapor Deposition CVD XVI ECS Proceedings, Allendorf, M., Maury, F., and Teyssandier, F. eds.
Hamelmann, F., et al., 2003. Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In M. Allendorf, F. Maury, & F. Teyssandier, eds. Chemical Vapor Deposition CVD XVI ECS Proceedings.
F. Hamelmann, et al., “Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor”, Chemical Vapor Deposition CVD XVI ECS Proceedings, M. Allendorf, F. Maury, and F. Teyssandier, eds., 2003.
Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., Siemeling, U.: Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In: Allendorf, M., Maury, F., and Teyssandier, F. (eds.) Chemical Vapor Deposition CVD XVI ECS Proceedings. (2003).
Hamelmann, Frank, Brechling, Armin, Aschentrup, A, Heinzmann, Ulrich, Jutzi, Peter, Sandrock, J, and Siemeling, U. “Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor”. Chemical Vapor Deposition CVD XVI ECS Proceedings. Ed. M Allendorf, F Maury, and F Teyssandier. 2003.
Google Scholar