Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing

Kleineberg U, Westerwalbesloh T, Hachmann W, Heinzmann U, Tummler J, Scholze F, Ulm G, Mullender S (2003)
In: Thin Solid Films. THIN SOLID FILMS, 433(1-2). ELSEVIER SCIENCE SA: 230-236.

Konferenzbeitrag | Veröffentlicht | Englisch
 
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Autor*in
Kleineberg, U; Westerwalbesloh, T; Hachmann, WiebkeUniBi; Heinzmann, UlrichUniBi; Tummler, J; Scholze, F; Ulm, G; Mullender, S
Abstract / Bemerkung
Our current status of Mo/Si multilayer extreme ultraviolet coatings fabricated by UHV e-beam evaporation and ion polishing is presented. Standard Mo/Si multilayer coating deposited onto 4 inch Si-wafer substrates showing peak reflectivities of 67.4% with a lateral homogeneity in coating reflectance of approximately 0.3% and a variation in peak wavelength of approximately 0.05 nm. over the full aperture have been achieved. At-wavelength reflectivities achieved for comparable multilayer coatings deposited onto Zerodur substrates with an enhanced microroughness (sigma = 0.55 nm) is shown to drop severely by almost 10%. A partial smoothing could be achieved by applying thin a-C buffer layers to these substrates, which in turn enhance the atwavelength reflectivity of the Mo/Si multilayer by 0.7%. (C) 2003 Elsevier Science B.V. All rights reserved.
Stichworte
UHV e-beam evaporation; At-wavelength; extreme ultraviolet coatings
Erscheinungsjahr
2003
Titel des Konferenzbandes
Thin Solid Films
Band
433
Ausgabe
1-2
Seite(n)
230-236
ISSN
0040-6090
Page URI
https://pub.uni-bielefeld.de/record/1611059

Zitieren

Kleineberg U, Westerwalbesloh T, Hachmann W, et al. Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing. In: Thin Solid Films. THIN SOLID FILMS. Vol 433. ELSEVIER SCIENCE SA; 2003: 230-236.
Kleineberg, U., Westerwalbesloh, T., Hachmann, W., Heinzmann, U., Tummler, J., Scholze, F., Ulm, G., et al. (2003). Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing. Thin Solid Films, THIN SOLID FILMS, 433, 230-236. ELSEVIER SCIENCE SA. doi:10.1016/S0040-6090(03)00289-X
Kleineberg, U., Westerwalbesloh, T., Hachmann, W., Heinzmann, U., Tummler, J., Scholze, F., Ulm, G., and Mullender, S. (2003). “Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing” in Thin Solid Films THIN SOLID FILMS, vol. 433, (ELSEVIER SCIENCE SA), 230-236.
Kleineberg, U., et al., 2003. Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing. In Thin Solid Films. THIN SOLID FILMS. no.433 ELSEVIER SCIENCE SA, pp. 230-236.
U. Kleineberg, et al., “Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing”, Thin Solid Films, THIN SOLID FILMS, vol. 433, ELSEVIER SCIENCE SA, 2003, pp.230-236.
Kleineberg, U., Westerwalbesloh, T., Hachmann, W., Heinzmann, U., Tummler, J., Scholze, F., Ulm, G., Mullender, S.: Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing. Thin Solid Films. THIN SOLID FILMS. 433, p. 230-236. ELSEVIER SCIENCE SA (2003).
Kleineberg, U, Westerwalbesloh, T, Hachmann, Wiebke, Heinzmann, Ulrich, Tummler, J, Scholze, F, Ulm, G, and Mullender, S. “Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing”. Thin Solid Films. ELSEVIER SCIENCE SA, 2003.Vol. 433. THIN SOLID FILMS. 230-236.