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1 Publikation

2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604354
Deposition of silicon oxide thin films in TEOS with addition of oxygen to the plasma ambient: IR spectra analysis
Hamelmann F, Heinzmann U, Szekeres A, Kirov N, Nikolova T (2005)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 389-392.
PUB | WoS
 

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