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6 Publikationen

2015 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2766870
Cobalt-iron oxides made by CVD for low temperature catalytic application
Mountapmbeme Kouotou, Patrick, Cobalt-iron oxides made by CVD for low temperature catalytic application. physica status solidi (a) 212 (7). , 2015
PUB | DOI | WoS
 
2009 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1634318
Chemical vapor deposition and electric characterization of perovskite oxides LaMO3 (M = Co, Fe, Cr and Mn) thin films
Tchoua Ngamou, Patrick Hervé, Chemical vapor deposition and electric characterization of perovskite oxides LaMO3 (M = Co, Fe, Cr and Mn) thin films. JOURNAL OF SOLID STATE CHEMISTRY 182 (4). , 2009
PUB | DOI | WoS
 
2008 | Bielefelder E-Dissertation | PUB-ID: 2302419
Dotierung der Spinellstruktur von Kobaltoxid-Dünnschichten und deren Auswirkungen auf die physikalisch-chemischen Eigenschaften
Feldmann, Janine, Dotierung der Spinellstruktur von Kobaltoxid-Dünnschichten und deren Auswirkungen auf die physikalisch-chemischen Eigenschaften. (). Bielefeld (Germany), 2008
PUB | PDF
 
2007 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1631529
Self-catalyzed chemical vapor deposition method for the growth of device-quality metal thin films
Bahlawane, Naoufal, Self-catalyzed chemical vapor deposition method for the growth of device-quality metal thin films. MICROELECTRONIC ENGINEERING 84 (11). , 2007
PUB | DOI | WoS
 
2007 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1632872
Alcohol-assisted CVD of silver using commercially available precursors
Bahlawane, Naoufal, Alcohol-assisted CVD of silver using commercially available precursors. CHEMICAL VAPOR DEPOSITION 13 (8). , 2007
PUB | DOI | WoS
 
2003 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1611059
Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing
Kleineberg, U, Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing. 433 (1-2). , 2003
PUB | DOI | WoS
 

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