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6 Publikationen

2009 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1589799
Electrochromic mixed films based On WO3 and MoO3, obtained by an APCVD method
Ivanova T, Gesheva KA, Kalitzova M, Hamelmann F, Lükermann F, Heinzmann U (2009)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 11(10): 1513-1516.
PUB | WoS
 
2007 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1630953
Spectroscopic, magnetic and crystal structure investigation of a new pseudo-Dawson nano-sized polyoxometalate cluster with mixed addenda
Patrut A, Margineanu D, Lowy DA, Kögerler P, Schmidtmann M, Bögge H (2007)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 9(12): 3921-3926.
PUB | WoS
 
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604367
Electrical properties of plasma-assisted CVD deposited thin silicon oxynitride films
Szekeres A, Simeonov S, Gushterov A, Nikolova T, Hamelmann F, Heinzmann U (2005)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 553-556.
PUB | WoS
 
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604354
Deposition of silicon oxide thin films in TEOS with addition of oxygen to the plasma ambient: IR spectra analysis
Hamelmann F, Heinzmann U, Szekeres A, Kirov N, Nikolova T (2005)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 389-392.
PUB | WoS
 
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604360
Optical and electrochromic characterization of multilayered mixed metal oxide thin films
Hamelmann F, Gesheva K, Ivanova T, Szekeres A, Abrashev M, Heinzmann U (2005)
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS 7(1): 393-396.
PUB | WoS
 
2003 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2351809
Amorphous silicon - A promising material for diodes with ultra thin absorber
Stiebig H, Mandryka V, Bunte E, Büchner H-J, Jun KH, Jäger G (2003)
J. Optoelectron. Adv. Mater. 5(5): 1305-1317.
PUB | WoS
 

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