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55 Publikationen

2007 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1593514
Lin J, Neuhaeusler U, Slieh J, et al. Actinic inspection of EUVL mask blank defects by photoemission electron microscopy: Effect of inspection wavelength variation. MICROELECTRONIC ENGINEERING. 2007;84(5-8):1011-1014.
PUB | DOI | WoS
 
2007 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1595083
Uiberacker M, Uphues T, Schultze M, et al. Attosecond real-time observation of electron tunnelling in atoms. Nature. 2007;446(7136):627-632.
PUB | DOI | WoS | PubMed | Europe PMC
 
2007 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1631830
Cavalieri AL, Müller N, Uphues T, et al. Attosecond spectroscopy in condensed matter. Nature. 2007;449(7165):1029-1032.
PUB | DOI | WoS | PubMed | Europe PMC
 
2007 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1631440
Maul J, Lin J, Oelsner A, et al. Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode. SURFACE SCIENCE. 2007;601(20):4758-4763.
PUB | DOI | WoS
 
2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1596280
Lin J, Neuhaeusler U, Slieh J, et al. Actinic extreme ultraviolet lithography mask blank defect inspection by photoemission electron microscopy. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2006;24(6):2631-2635.
PUB | DOI | WoS
 
2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1597153
Müller N, Khalil T, Pohl M, et al. Interference of spin states in resonant photoemission induced by circularly polarized light from magnetized Gd. PHYSICAL REVIEW B. 2006;74(16): 161401.
PUB | DOI | WoS
 
2006 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1599271
Neuhäusler U, Lin J, Oelsner A, et al. A new approach for actinic defect inspection of EUVL multilayer mask blanks: Standing wave photoemission electron microscopy. MICROELECTRONIC ENGINEERING. 2006;83(4-9):680-683.
PUB | DOI | WoS
 
2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1600433
Neuhäusler U, Oelsner A, Slieh J, et al. High-resolution actinic defect inspection for extreme ultraviolet lithography multilayer mask blanks by photoemission electron microscopy. APPLIED PHYSICS LETTERS. 2006;88(5): 053113.
PUB | DOI | WoS
 
2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1601030
Szekeres A, Nikolova T, Simeonov S, Gushterov A, Hamelmann F, Heinzmann U. Plasma-assisted chemical vapor deposited silicon oxynitride as an alternative material for gate dielectric in MOS devices. MICROELECTRONICS JOURNAL. 2006;37(1):64-70.
PUB | DOI | WoS
 
2006 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1599019
Wonisch A, Neuhäusler U, Kabachnik NM, et al. Design, fabrication, and analysis of chirped multilayer mirrors for reflection of extreme-ultraviolet attosecond pulses. APPLIED OPTICS. 2006;45(17):4147-4156.
PUB | DOI | WoS | PubMed | Europe PMC
 
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1874437
Gesheva K, Ivanova T, Steinman E, Hamelmann F, Heinzmann U, Brechling A. Technology and characterization of CVD-grown mixed Mo/W oxide films and electrochromic devices made on their basis. In: ECS Proceedings PV 2005-09. 2005: 799-799.
PUB
 
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604367
Szekeres A, Simeonov S, Gushterov A, Nikolova T, Hamelmann F, Heinzmann U. Electrical properties of plasma-assisted CVD deposited thin silicon oxynitride films. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS. 2005;7(1):553-556.
PUB | WoS
 
2005 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1605048
Uiberacker M, Goulielmakis E, Kienberger R, et al. Attosecond metrology with controlled light waveforms. LASER PHYSICS. 2005;15(1):195-204.
PUB | WoS
 
2005 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1605264
Wieland M, Spielmann C, Kleineberg U, Westerwalbesloh T, Heinzmann U, Wilhein T. Toward time-resolved soft X-ray microscopy using pulsed fs-high-harmonic radiation. ULTRAMICROSCOPY. 2005;102(2):93-100.
PUB | DOI | WoS | PubMed | Europe PMC
 
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604354
Hamelmann F, Heinzmann U, Szekeres A, Kirov N, Nikolova T. Deposition of silicon oxide thin films in TEOS with addition of oxygen to the plasma ambient: IR spectra analysis. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS. 2005;7(1):389-392.
PUB | WoS
 
2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 1604360
Hamelmann F, Gesheva K, Ivanova T, Szekeres A, Abrashev M, Heinzmann U. Optical and electrochromic characterization of multilayered mixed metal oxide thin films. JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS. 2005;7(1):393-396.
PUB | WoS
 
2004 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1876589
Drescher M, Hentschel M, Kienberger R, et al. Time-resolved inner-shell spectroscopy with sub-fs EUV pulses. In: Krausz F, Korn G, Corkum P, Walmsley IA, eds. Ultrafast Optics IV. Springer Series in OPTICAL SCIENCES. Vol 95. New York: Springer; 2004.
PUB | DOI
 
2004 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1876611
Westerwalbesloh T, Kleineberg U, Lim YC, Siffalovic P, Drescher M, Heinzmann U. Multilayer EUV Optics for Applications of Ultrashort High Harmonic Pulses. In: Krausz F, Korn G, Corkum P, Walmsley IA, eds. Ultrafast Optics IV. Springer Series in OPTICAL SCIENCES. Vol 95. New York: Springer; 2004.
PUB | DOI
 
2004 | Sammelwerksbeitrag | Veröffentlicht | PUB-ID: 1876575
Wieland M, Spielmann C, Kleineberg U, Heinzmann U, Wilhein T. Application of high-harmonic radiation for EUV interferometry and spectroscopy. In: Krausz F, Korn G, Corkum P, Walmsley IA, eds. Ultrafast Optics IV. Springer Series in OPTICAL SCIENCES. Vol 95. New York: Springer; 2004: 467-467.
PUB | DOI
 
2004 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1875279
Drescher M, Hentschel M, Kienberger P, et al. Time-resolved electron spectroscopy of atomic inner-shell dynamics. J. Electr. Spectr. 137-140. 2004;137-140:259-264.
PUB | DOI | WoS
 

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