Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe
Klauser R, Hong I-H, Wang S-C, Zharnikov M, Paul A, Gölzhäuser A, Terfort A, Chuang TJ (2003)
JOURNAL OF PHYSICAL CHEMISTRY B 107(47): 13133-13142.
Zeitschriftenaufsatz
| Veröffentlicht | Englisch
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Autor*in
Klauser, Ruth;
Hong, I.-H.;
Wang, S.-C.;
Zharnikov, M.;
Paul, A.;
Gölzhäuser, ArminUniBi 
;
Terfort, A.;
Chuang, T. J.
;
Terfort, A.;
Chuang, T. J.Abstract / Bemerkung
Soft X-ray scanning photoelectron microscopy (SPEM) was applied to image and characterize molecular patterns produced by electron irradiation of various aliphatic and aromatic thiol-derived self-assembled monolayers (SAMs). The observed chemical contrasts allowed us to monitor complex phenomena which occurred as a result of electron-beam patterning, the exposure of the patterned films to ambient, and the irradiation of the films by the X-ray microprobe during image acquisition. The latter effect has been analyzed in detail and utilized for direct lithographic writing in the SAM resists by the zone-plate-focused X-ray beam. The results demonstrate the capabilities of the SPEM technique both for chemical imaging and as a fabrication tool for micro- and nanolithography.
Erscheinungsjahr
2003
Zeitschriftentitel
JOURNAL OF PHYSICAL CHEMISTRY B
Band
107
Ausgabe
47
Seite(n)
13133-13142
Page URI
https://pub.uni-bielefeld.de/record/2982737
Zitieren
Klauser R, Hong I-H, Wang S-C, et al. Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe. JOURNAL OF PHYSICAL CHEMISTRY B. 2003;107(47):13133-13142.
Klauser, R., Hong, I. - H., Wang, S. - C., Zharnikov, M., Paul, A., Gölzhäuser, A., Terfort, A., et al. (2003). Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe. JOURNAL OF PHYSICAL CHEMISTRY B, 107(47), 13133-13142. https://doi.org/10.1021/jp0307396
Klauser, Ruth, Hong, I.-H., Wang, S.-C., Zharnikov, M., Paul, A., Gölzhäuser, Armin, Terfort, A., and Chuang, T. J. 2003. “Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe”. JOURNAL OF PHYSICAL CHEMISTRY B 107 (47): 13133-13142.
Klauser, R., Hong, I. - H., Wang, S. - C., Zharnikov, M., Paul, A., Gölzhäuser, A., Terfort, A., and Chuang, T. J. (2003). Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe. JOURNAL OF PHYSICAL CHEMISTRY B 107, 13133-13142.
Klauser, R., et al., 2003. Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe. JOURNAL OF PHYSICAL CHEMISTRY B, 107(47), p 13133-13142.
R. Klauser, et al., “Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe”, JOURNAL OF PHYSICAL CHEMISTRY B, vol. 107, 2003, pp. 13133-13142.
Klauser, R., Hong, I.-H., Wang, S.-C., Zharnikov, M., Paul, A., Gölzhäuser, A., Terfort, A., Chuang, T.J.: Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe. JOURNAL OF PHYSICAL CHEMISTRY B. 107, 13133-13142 (2003).
Klauser, Ruth, Hong, I.-H., Wang, S.-C., Zharnikov, M., Paul, A., Gölzhäuser, Armin, Terfort, A., and Chuang, T. J. “Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe”. JOURNAL OF PHYSICAL CHEMISTRY B 107.47 (2003): 13133-13142.
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