To Mask or Not to Mask : Epistemic Injustice in the COVID-19 Pandemic

Chen H-Y, Yu L-A, Huang LT-L (2021)
Techné: Research in Philosophy and Technology 25(3): 503-512.

Zeitschriftenaufsatz | Veröffentlicht | Englisch
 
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Autor*in
Chen, Hsiang-Yun; Yu, Li-AnUniBi ; Huang, Linus Ta-Lun
Abstract / Bemerkung
Reluctance to adopt mask-wearing as a preventive measure is widely observed in many Western societies since the beginning of the COVID-19 pandemics. This reluctance toward mask adoption, like any other complex social phenomena, will have multiple causes. Plausible explanations have been identified, including political polarization, skepticism about media reports and the authority of public health agencies, and concerns over liberty, amongst others. In this paper, we propose potential explanations hitherto unnoticed, based on the framework of epistemic injustice. We show how testimonial injustice and hermeneutical injustice may be at work to shape the reluctant mask adoption at both the societal and individual levels. We end by suggesting how overcoming these epistemic injustices can benefit the global community in this challenging situation and in the future.
Erscheinungsjahr
2021
Zeitschriftentitel
Techné: Research in Philosophy and Technology
Band
25
Ausgabe
3
Seite(n)
503-512
ISSN
2691-5928
Page URI
https://pub.uni-bielefeld.de/record/2962660

Zitieren

Chen H-Y, Yu L-A, Huang LT-L. To Mask or Not to Mask : Epistemic Injustice in the COVID-19 Pandemic. Techné: Research in Philosophy and Technology. 2021;25(3):503-512.
Chen, H. - Y., Yu, L. - A., & Huang, L. T. - L. (2021). To Mask or Not to Mask : Epistemic Injustice in the COVID-19 Pandemic. Techné: Research in Philosophy and Technology, 25(3), 503-512. https://doi.org/10.5840/techne20211123149
Chen, Hsiang-Yun, Yu, Li-An, and Huang, Linus Ta-Lun. 2021. “To Mask or Not to Mask : Epistemic Injustice in the COVID-19 Pandemic”. Techné: Research in Philosophy and Technology 25 (3): 503-512.
Chen, H. - Y., Yu, L. - A., and Huang, L. T. - L. (2021). To Mask or Not to Mask : Epistemic Injustice in the COVID-19 Pandemic. Techné: Research in Philosophy and Technology 25, 503-512.
Chen, H.-Y., Yu, L.-A., & Huang, L.T.-L., 2021. To Mask or Not to Mask : Epistemic Injustice in the COVID-19 Pandemic. Techné: Research in Philosophy and Technology, 25(3), p 503-512.
H.-Y. Chen, L.-A. Yu, and L.T.-L. Huang, “To Mask or Not to Mask : Epistemic Injustice in the COVID-19 Pandemic”, Techné: Research in Philosophy and Technology, vol. 25, 2021, pp. 503-512.
Chen, H.-Y., Yu, L.-A., Huang, L.T.-L.: To Mask or Not to Mask : Epistemic Injustice in the COVID-19 Pandemic. Techné: Research in Philosophy and Technology. 25, 503-512 (2021).
Chen, Hsiang-Yun, Yu, Li-An, and Huang, Linus Ta-Lun. “To Mask or Not to Mask : Epistemic Injustice in the COVID-19 Pandemic”. Techné: Research in Philosophy and Technology 25.3 (2021): 503-512.

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