Freestanding carbon nanomembranes and graphene monolayers nanopatterned via EUV interference lithography

Winter A, Ekinci Y, Gölzhäuser A, Turchanin A (2019)
2D MATERIALS 6(2): 021002.

Zeitschriftenaufsatz | Veröffentlicht | Englisch
 
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Autor*in
Winter, Andreas; Ekinci, Yasin; Gölzhäuser, ArminUniBi ; Turchanin, Andrey
Abstract / Bemerkung
Two-dimensional materials, such as graphene, molecular nanosheets, hexagonal boron nitride or transition metal dichalcogenides have recently attracted substantial interest due to their potential use in electronics, chemical and biological sensors, nanooptics, and catalysis. For most of these applications, the functional nanostructures have to be prepared lithographically. In this respect, extreme ultraviolet interference lithography provides both high-resolution patterning with an ultimate limit in the sub-10 nm range and high throughput capability. Here we present the preparation of nanopatterned 1 nm thick freestanding molecular nanosheets-carbon nanomembranes (CNMs)-and single layer graphene employing this method and their characterization with a helium ion microscope. We demonstrate periodic arrays of suspended nanostructures of CNMs and graphene including nanoribbons with width between 20 nm and 500 nm and nanomeshes with openings between 140 nm and 300 nm and mesh lines down to 90 nm.
Erscheinungsjahr
2019
Zeitschriftentitel
2D MATERIALS
Band
6
Ausgabe
2
Art.-Nr.
021002
ISSN
2053-1583
Page URI
https://pub.uni-bielefeld.de/record/2934110

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Winter A, Ekinci Y, Gölzhäuser A, Turchanin A. Freestanding carbon nanomembranes and graphene monolayers nanopatterned via EUV interference lithography. 2D MATERIALS. 2019;6(2): 021002.
Winter, A., Ekinci, Y., Gölzhäuser, A., & Turchanin, A. (2019). Freestanding carbon nanomembranes and graphene monolayers nanopatterned via EUV interference lithography. 2D MATERIALS, 6(2), 021002. doi:10.1088/2053-1583/ab0014
Winter, A., Ekinci, Y., Gölzhäuser, A., and Turchanin, A. (2019). Freestanding carbon nanomembranes and graphene monolayers nanopatterned via EUV interference lithography. 2D MATERIALS 6:021002.
Winter, A., et al., 2019. Freestanding carbon nanomembranes and graphene monolayers nanopatterned via EUV interference lithography. 2D MATERIALS, 6(2): 021002.
A. Winter, et al., “Freestanding carbon nanomembranes and graphene monolayers nanopatterned via EUV interference lithography”, 2D MATERIALS, vol. 6, 2019, : 021002.
Winter, A., Ekinci, Y., Gölzhäuser, A., Turchanin, A.: Freestanding carbon nanomembranes and graphene monolayers nanopatterned via EUV interference lithography. 2D MATERIALS. 6, : 021002 (2019).
Winter, Andreas, Ekinci, Yasin, Gölzhäuser, Armin, and Turchanin, Andrey. “Freestanding carbon nanomembranes and graphene monolayers nanopatterned via EUV interference lithography”. 2D MATERIALS 6.2 (2019): 021002.

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