Titanium nitride as a seed layer for Heusler compounds

Niesen A, Glas M, Ludwig J, Schmalhorst J-M, Sahoo R, Ebke D, Arenholz E, Reiss G (2015)
Journal of Applied Physics 118(24): 243904.

Zeitschriftenaufsatz | Veröffentlicht | Englisch
 
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Autor*in
Niesen, AlessiaUniBi; Glas, ManuelUniBi; Ludwig, Jana; Schmalhorst, Jan-MichaelUniBi ; Sahoo, Roshnee; Ebke, Daniel; Arenholz, Elke; Reiss, GünterUniBi
Abstract / Bemerkung
Titanium nitride (TiN) shows low resistivity at room temperature (27 mu Omega cm), high thermal stability and thus has the potential to serve as seed layer in magnetic tunnel junctions. High quality TiN thin films with regard to the crystallographic and electrical properties were grown and characterized by x-ray diffraction and 4-terminal transport measurements. Element specific x-ray absorption spectroscopy revealed pure TiN inside the thin films. To investigate the influence of a TiN seed layer on a ferro(i)magnetic bottom electrode in magnetic tunnel junctions, an out-of-plane magnetized Mn2.45Ga as well as in- and out-of-plane magnetized Co2FeAl thin films were deposited on a TiN buffer, respectively. The magnetic properties were investigated using a superconducting quantum interference device and anomalous Hall effect for Mn2.45Ga. Magneto optical Kerr effect measurements were carried out to investigate the magnetic properties of Co2FeAl. TiN buffered Mn2.45Ga thin films showed higher coercivity and squareness ratio compared to unbuffered samples. The Heusler compound Co2FeAl showed already good crystallinity when grown at room temperature on a TiN seed-layer. (C) 2015 AIP Publishing LLC.
Erscheinungsjahr
2015
Zeitschriftentitel
Journal of Applied Physics
Band
118
Ausgabe
24
Art.-Nr.
243904
ISSN
0021-8979
eISSN
1089-7550
Page URI
https://pub.uni-bielefeld.de/record/2901295

Zitieren

Niesen A, Glas M, Ludwig J, et al. Titanium nitride as a seed layer for Heusler compounds. Journal of Applied Physics. 2015;118(24): 243904.
Niesen, A., Glas, M., Ludwig, J., Schmalhorst, J. - M., Sahoo, R., Ebke, D., Arenholz, E., et al. (2015). Titanium nitride as a seed layer for Heusler compounds. Journal of Applied Physics, 118(24), 243904. doi:10.1063/1.4938388
Niesen, Alessia, Glas, Manuel, Ludwig, Jana, Schmalhorst, Jan-Michael, Sahoo, Roshnee, Ebke, Daniel, Arenholz, Elke, and Reiss, Günter. 2015. “Titanium nitride as a seed layer for Heusler compounds”. Journal of Applied Physics 118 (24): 243904.
Niesen, A., Glas, M., Ludwig, J., Schmalhorst, J. - M., Sahoo, R., Ebke, D., Arenholz, E., and Reiss, G. (2015). Titanium nitride as a seed layer for Heusler compounds. Journal of Applied Physics 118:243904.
Niesen, A., et al., 2015. Titanium nitride as a seed layer for Heusler compounds. Journal of Applied Physics, 118(24): 243904.
A. Niesen, et al., “Titanium nitride as a seed layer for Heusler compounds”, Journal of Applied Physics, vol. 118, 2015, : 243904.
Niesen, A., Glas, M., Ludwig, J., Schmalhorst, J.-M., Sahoo, R., Ebke, D., Arenholz, E., Reiss, G.: Titanium nitride as a seed layer for Heusler compounds. Journal of Applied Physics. 118, : 243904 (2015).
Niesen, Alessia, Glas, Manuel, Ludwig, Jana, Schmalhorst, Jan-Michael, Sahoo, Roshnee, Ebke, Daniel, Arenholz, Elke, and Reiss, Günter. “Titanium nitride as a seed layer for Heusler compounds”. Journal of Applied Physics 118.24 (2015): 243904.
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