Inductive determination of the optimum tunnel barrier thickness in magnetic tunneling junction stacks for spin torque memory applications
Serrano-Guisan S, Skowronski W, Wrona J, Liebing N, Czapkiewicz M, Stobiecki T, Reiss G, Schumacher HW (2011)
Journal of Applied Physics 110(2): 23906.
Zeitschriftenaufsatz
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Autor*in
Serrano-Guisan, S.;
Skowronski, WitoldUniBi;
Wrona, J.;
Liebing, N.;
Czapkiewicz, M.;
Stobiecki, T.;
Reiss, GünterUniBi ;
Schumacher, H. W.
Einrichtung
Abstract / Bemerkung
We use pulsed inductive microwave magnetometry to study the precessional magnetization dynamics of the free layer in CoFeB/MgO/CoFeB based magnetic tunneling junction stacks with varying MgO barrier thickness. From the field dependence of the precession frequency we are able to derive the uniaxial anisotropy energy of the free layer and the exchange coupling between the free and the pinned layer. Furthermore the field dependence of the effective damping parameter is derived. Below a certain threshold barrier thickness we observe an increased effective damping for antiparallel orientation of free and pinned layer which would inhibit reversible low current density spin torque magnetization reversal. Such inductive measurements, in combination with wafer probe station based magneto transport experiments, allow a fast determination of the optimum tunnel barrier thickness range for spin torque memory applications in a lithography free process. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3610948]
Erscheinungsjahr
2011
Zeitschriftentitel
Journal of Applied Physics
Band
110
Ausgabe
2
Art.-Nr.
23906
ISSN
0021-8979
Page URI
https://pub.uni-bielefeld.de/record/2394574
Zitieren
Serrano-Guisan S, Skowronski W, Wrona J, et al. Inductive determination of the optimum tunnel barrier thickness in magnetic tunneling junction stacks for spin torque memory applications. Journal of Applied Physics. 2011;110(2): 23906.
Serrano-Guisan, S., Skowronski, W., Wrona, J., Liebing, N., Czapkiewicz, M., Stobiecki, T., Reiss, G., et al. (2011). Inductive determination of the optimum tunnel barrier thickness in magnetic tunneling junction stacks for spin torque memory applications. Journal of Applied Physics, 110(2), 23906. https://doi.org/10.1063/1.3610948
Serrano-Guisan, S., Skowronski, Witold, Wrona, J., Liebing, N., Czapkiewicz, M., Stobiecki, T., Reiss, Günter, and Schumacher, H. W. 2011. “Inductive determination of the optimum tunnel barrier thickness in magnetic tunneling junction stacks for spin torque memory applications”. Journal of Applied Physics 110 (2): 23906.
Serrano-Guisan, S., Skowronski, W., Wrona, J., Liebing, N., Czapkiewicz, M., Stobiecki, T., Reiss, G., and Schumacher, H. W. (2011). Inductive determination of the optimum tunnel barrier thickness in magnetic tunneling junction stacks for spin torque memory applications. Journal of Applied Physics 110:23906.
Serrano-Guisan, S., et al., 2011. Inductive determination of the optimum tunnel barrier thickness in magnetic tunneling junction stacks for spin torque memory applications. Journal of Applied Physics, 110(2): 23906.
S. Serrano-Guisan, et al., “Inductive determination of the optimum tunnel barrier thickness in magnetic tunneling junction stacks for spin torque memory applications”, Journal of Applied Physics, vol. 110, 2011, : 23906.
Serrano-Guisan, S., Skowronski, W., Wrona, J., Liebing, N., Czapkiewicz, M., Stobiecki, T., Reiss, G., Schumacher, H.W.: Inductive determination of the optimum tunnel barrier thickness in magnetic tunneling junction stacks for spin torque memory applications. Journal of Applied Physics. 110, : 23906 (2011).
Serrano-Guisan, S., Skowronski, Witold, Wrona, J., Liebing, N., Czapkiewicz, M., Stobiecki, T., Reiss, Günter, and Schumacher, H. W. “Inductive determination of the optimum tunnel barrier thickness in magnetic tunneling junction stacks for spin torque memory applications”. Journal of Applied Physics 110.2 (2011): 23906.
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