Exposure of monomolecular resists with low energy electrons
Kirk ECG, Mertig M, Monch I, Bertram M, Schumann J, vanLoyen L, Gladun A, Reiss G (1995)
Nanostructured Materials 6(5-8): 703-706.
Zeitschriftenaufsatz
| Veröffentlicht | Englisch
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Autor*in
Kirk, ECG;
Mertig, M;
Monch, I;
Bertram, M;
Schumann, J;
vanLoyen, L;
Gladun, A;
Reiss, GünterUniBi 
Abstract / Bemerkung
Monomolecular resist films of tricosenoic and tricosenoic acid as well as polymethylmethacrylate (PMMA), prepared on thin Au and PT films by the Langmuir-Blodgett (LB) technique have been exposed by electron-beams with an energy down to 2 keV. Below 5 keV, PMMA was found to act either as positive or negative resist depending on the dose. Ultra low voltage beam (less than or equal to 10 V) experiments with the scanning tunnelling microscope (STM) have not yet resulted in polymerization of the films. Pattern transfer into the Au films by wet or Ar ion etching has been demonstrated.
Erscheinungsjahr
1995
Zeitschriftentitel
Nanostructured Materials
Band
6
Ausgabe
5-8
Seite(n)
703-706
ISSN
0965-9773
Page URI
https://pub.uni-bielefeld.de/record/2353184
Zitieren
Kirk ECG, Mertig M, Monch I, et al. Exposure of monomolecular resists with low energy electrons. Nanostructured Materials. 1995;6(5-8):703-706.
Kirk, E. C. G., Mertig, M., Monch, I., Bertram, M., Schumann, J., vanLoyen, L., Gladun, A., et al. (1995). Exposure of monomolecular resists with low energy electrons. Nanostructured Materials, 6(5-8), 703-706. https://doi.org/10.1016/0965-9773(95)00155-7
Kirk, ECG, Mertig, M, Monch, I, Bertram, M, Schumann, J, vanLoyen, L, Gladun, A, and Reiss, Günter. 1995. “Exposure of monomolecular resists with low energy electrons”. Nanostructured Materials 6 (5-8): 703-706.
Kirk, E. C. G., Mertig, M., Monch, I., Bertram, M., Schumann, J., vanLoyen, L., Gladun, A., and Reiss, G. (1995). Exposure of monomolecular resists with low energy electrons. Nanostructured Materials 6, 703-706.
Kirk, E.C.G., et al., 1995. Exposure of monomolecular resists with low energy electrons. Nanostructured Materials, 6(5-8), p 703-706.
E.C.G. Kirk, et al., “Exposure of monomolecular resists with low energy electrons”, Nanostructured Materials, vol. 6, 1995, pp. 703-706.
Kirk, E.C.G., Mertig, M., Monch, I., Bertram, M., Schumann, J., vanLoyen, L., Gladun, A., Reiss, G.: Exposure of monomolecular resists with low energy electrons. Nanostructured Materials. 6, 703-706 (1995).
Kirk, ECG, Mertig, M, Monch, I, Bertram, M, Schumann, J, vanLoyen, L, Gladun, A, and Reiss, Günter. “Exposure of monomolecular resists with low energy electrons”. Nanostructured Materials 6.5-8 (1995): 703-706.
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