Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness

van Dorp WF, Laczic I, Beyer A, Gölzhäuser A, Wagner JB, Hansen TW, Hagen CW (2011)
Nanotechnology 22(11): 115303.

Zeitschriftenaufsatz | Veröffentlicht | Englisch
 
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Autor*in
van Dorp, W.F.; Laczic, I.; Beyer, AndréUniBi ; Gölzhäuser, ArminUniBi ; Wagner, J.B.; Hansen, T.W.; Hagen, C.W.
Erscheinungsjahr
2011
Zeitschriftentitel
Nanotechnology
Band
22
Ausgabe
11
Art.-Nr.
115303
ISSN
0957-4484
eISSN
1361-6528
Page URI
https://pub.uni-bielefeld.de/record/1987903

Zitieren

van Dorp WF, Laczic I, Beyer A, et al. Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology. 2011;22(11): 115303.
van Dorp, W. F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J. B., Hansen, T. W., & Hagen, C. W. (2011). Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology, 22(11), 115303. https://doi.org/10.1088/0957-4484/22/11/115303
van Dorp, W.F., Laczic, I., Beyer, André, Gölzhäuser, Armin, Wagner, J.B., Hansen, T.W., and Hagen, C.W. 2011. “Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness”. Nanotechnology 22 (11): 115303.
van Dorp, W. F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J. B., Hansen, T. W., and Hagen, C. W. (2011). Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology 22:115303.
van Dorp, W.F., et al., 2011. Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology, 22(11): 115303.
W.F. van Dorp, et al., “Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness”, Nanotechnology, vol. 22, 2011, : 115303.
van Dorp, W.F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J.B., Hansen, T.W., Hagen, C.W.: Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology. 22, : 115303 (2011).
van Dorp, W.F., Laczic, I., Beyer, André, Gölzhäuser, Armin, Wagner, J.B., Hansen, T.W., and Hagen, C.W. “Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness”. Nanotechnology 22.11 (2011): 115303.

4 Zitationen in Europe PMC

Daten bereitgestellt von Europe PubMed Central.

Charged particle single nanometre manufacturing.
Prewett PD, Hagen CW, Lenk C, Lenk S, Kaestner M, Ivanov T, Ahmad A, Rangelow IW, Shi X, Boden SA, Robinson APG, Yang D, Hari S, Scotuzzi M, Huq E., Beilstein J Nanotechnol 9(), 2018
PMID: 30498657
Modelling focused electron beam induced deposition beyond Langmuir adsorption.
Sanz-Hernández D, Fernández-Pacheco A., Beilstein J Nanotechnol 8(), 2017
PMID: 29090116
Complete ligand loss in electron ionization of the weakly bound organometallic tungsten hexacarbonyl dimer.
Neustetter M, Mauracher A, Limão-Vieira P, Denifl S., Phys Chem Chem Phys 18(15), 2016
PMID: 27006205
Low-energy electron interactions with tungsten hexacarbonyl--W(CO)6.
Wnorowski K, Stano M, Matias C, Denifl S, Barszczewska W, Matejčík Š., Rapid Commun Mass Spectrom 26(17), 2012
PMID: 22847710

23 References

Daten bereitgestellt von Europe PubMed Central.


AUTHOR UNKNOWN, 0

AUTHOR UNKNOWN, 0

AUTHOR UNKNOWN, 0
Focused electron-beam-induced deposition of 3 nm dots in a scanning electron microscope.
van Kouwen L, Botman A, Hagen CW., Nano Lett. 9(5), 2009
PMID: 19374377

AUTHOR UNKNOWN, 0
Growth behavior near the ultimate resolution of nanometer-scale focused electron beam-induced deposition.
van Dorp WF, Hagen CW, Crozier PA, Kruit P., Nanotechnology 19(22), 2008
PMID: 21825760

AUTHOR UNKNOWN, 0

AUTHOR UNKNOWN, 0

Silvis-Cividjian, Advances in Imaging and Electron Physics 143(), 2006

AUTHOR UNKNOWN, 0

AUTHOR UNKNOWN, 0

AUTHOR UNKNOWN, 0
Novel carbon nanosheets as support for ultrahigh-resolution structural analysis of nanoparticles.
Nottbohm CT, Beyer A, Sologubenko AS, Ennen I, Hutten A, Rosner H, Eck W, Mayer J, Golzhauser A., Ultramicroscopy 108(9), 2008
PMID: 18406532

Kieft, J Phys D Appl Phys 41(), 2008

AUTHOR UNKNOWN, 0

AUTHOR UNKNOWN, 0

AUTHOR UNKNOWN, 0

AUTHOR UNKNOWN, 0

AUTHOR UNKNOWN, 0

Childs, Handbook of Auger Electron Spectroscopy (), 1995

AUTHOR UNKNOWN, 0

Reimer, Scanning Electron Microscopy (), 1998
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