Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness

van Dorp WF, Laczic I, Beyer A, Gölzhäuser A, Wagner JB, Hansen TW, Hagen CW (2011)
Nanotechnology 22(11): 115303.

Zeitschriftenaufsatz | Veröffentlicht | Englisch
 
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Autor*in
van Dorp, W.F.; Laczic, I.; Beyer, AndréUniBi ; Gölzhäuser, ArminUniBi ; Wagner, J.B.; Hansen, T.W.; Hagen, C.W.
Erscheinungsjahr
2011
Zeitschriftentitel
Nanotechnology
Band
22
Ausgabe
11
Art.-Nr.
115303
ISSN
0957-4484
eISSN
1361-6528
Page URI
https://pub.uni-bielefeld.de/record/1987903

Zitieren

van Dorp WF, Laczic I, Beyer A, et al. Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology. 2011;22(11): 115303.
van Dorp, W. F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J. B., Hansen, T. W., & Hagen, C. W. (2011). Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology, 22(11), 115303. doi:10.1088/0957-4484/22/11/115303
van Dorp, W. F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J. B., Hansen, T. W., and Hagen, C. W. (2011). Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology 22:115303.
van Dorp, W.F., et al., 2011. Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology, 22(11): 115303.
W.F. van Dorp, et al., “Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness”, Nanotechnology, vol. 22, 2011, : 115303.
van Dorp, W.F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J.B., Hansen, T.W., Hagen, C.W.: Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology. 22, : 115303 (2011).
van Dorp, W.F., Laczic, I., Beyer, André, Gölzhäuser, Armin, Wagner, J.B., Hansen, T.W., and Hagen, C.W. “Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness”. Nanotechnology 22.11 (2011): 115303.

4 Zitationen in Europe PMC

Daten bereitgestellt von Europe PubMed Central.

Charged particle single nanometre manufacturing.
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PMID: 30498657
Modelling focused electron beam induced deposition beyond Langmuir adsorption.
Sanz-Hernández D, Fernández-Pacheco A., Beilstein J Nanotechnol 8(), 2017
PMID: 29090116
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Neustetter M, Mauracher A, Limão-Vieira P, Denifl S., Phys Chem Chem Phys 18(15), 2016
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Wnorowski K, Stano M, Matias C, Denifl S, Barszczewska W, Matejčík Š., Rapid Commun Mass Spectrom 26(17), 2012
PMID: 22847710

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