Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness
van Dorp WF, Laczic I, Beyer A, Gölzhäuser A, Wagner JB, Hansen TW, Hagen CW (2011)
Nanotechnology 22(11): 115303.
Zeitschriftenaufsatz
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Autor*in
van Dorp, W.F.;
Laczic, I.;
Beyer, AndréUniBi 
;
Gölzhäuser, ArminUniBi ;
Wagner, J.B.;
Hansen, T.W.;
Hagen, C.W.
;
Gölzhäuser, ArminUniBi ;
Wagner, J.B.;
Hansen, T.W.;
Hagen, C.W.Einrichtung
Erscheinungsjahr
2011
Zeitschriftentitel
Nanotechnology
Band
22
Ausgabe
11
Art.-Nr.
115303
ISSN
0957-4484
eISSN
1361-6528
Page URI
https://pub.uni-bielefeld.de/record/1987903
Zitieren
van Dorp WF, Laczic I, Beyer A, et al. Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology. 2011;22(11): 115303.
van Dorp, W. F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J. B., Hansen, T. W., & Hagen, C. W. (2011). Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology, 22(11), 115303. https://doi.org/10.1088/0957-4484/22/11/115303
van Dorp, W.F., Laczic, I., Beyer, André, Gölzhäuser, Armin, Wagner, J.B., Hansen, T.W., and Hagen, C.W. 2011. “Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness”. Nanotechnology 22 (11): 115303.
van Dorp, W. F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J. B., Hansen, T. W., and Hagen, C. W. (2011). Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology 22:115303.
van Dorp, W.F., et al., 2011. Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology, 22(11): 115303.
W.F. van Dorp, et al., “Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness”, Nanotechnology, vol. 22, 2011, : 115303.
van Dorp, W.F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J.B., Hansen, T.W., Hagen, C.W.: Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology. 22, : 115303 (2011).
van Dorp, W.F., Laczic, I., Beyer, André, Gölzhäuser, Armin, Wagner, J.B., Hansen, T.W., and Hagen, C.W. “Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness”. Nanotechnology 22.11 (2011): 115303.
Daten bereitgestellt von European Bioinformatics Institute (EBI)
4 Zitationen in Europe PMC
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