Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and their Comparison with Methyltrichlorosilane
Kunstmann T, Angerer H, Knecht J, Veprek S, Mitzel NW, Schmidbaur H (1995)
Chemistry of Materials 7(9): 1675-1679.
Zeitschriftenaufsatz
| Veröffentlicht | Englisch
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Autor*in
Kunstmann, T.;
Angerer, H.;
Knecht, J.;
Veprek, S.;
Mitzel, Norbert W.UniBi;
Schmidbaur, H.
Abstract / Bemerkung
Novel organometallic precursors, 1,3-bis(monobromosilyl)propane, 1,2-bis(monobromosilyl)ethane, and methyltribromosilane, for low-temperature deposition of beta-SiC have been developed, and the kinetics and mechanism of their decomposition investigated. On the basis of the results, heteroepitaxial thin films of beta-SiC with very good structural quality have been deposited on (100) Si using methyltribromosilane and methyltrichlorosilane.
Erscheinungsjahr
1995
Zeitschriftentitel
Chemistry of Materials
Band
7
Ausgabe
9
Seite(n)
1675-1679
ISSN
0897-4756
eISSN
1520-5002
Page URI
https://pub.uni-bielefeld.de/record/1929026
Zitieren
Kunstmann T, Angerer H, Knecht J, Veprek S, Mitzel NW, Schmidbaur H. Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and their Comparison with Methyltrichlorosilane. Chemistry of Materials. 1995;7(9):1675-1679.
Kunstmann, T., Angerer, H., Knecht, J., Veprek, S., Mitzel, N. W., & Schmidbaur, H. (1995). Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and their Comparison with Methyltrichlorosilane. Chemistry of Materials, 7(9), 1675-1679. https://doi.org/10.1021/cm00057a015
Kunstmann, T., Angerer, H., Knecht, J., Veprek, S., Mitzel, Norbert W., and Schmidbaur, H. 1995. “Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and their Comparison with Methyltrichlorosilane”. Chemistry of Materials 7 (9): 1675-1679.
Kunstmann, T., Angerer, H., Knecht, J., Veprek, S., Mitzel, N. W., and Schmidbaur, H. (1995). Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and their Comparison with Methyltrichlorosilane. Chemistry of Materials 7, 1675-1679.
Kunstmann, T., et al., 1995. Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and their Comparison with Methyltrichlorosilane. Chemistry of Materials, 7(9), p 1675-1679.
T. Kunstmann, et al., “Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and their Comparison with Methyltrichlorosilane”, Chemistry of Materials, vol. 7, 1995, pp. 1675-1679.
Kunstmann, T., Angerer, H., Knecht, J., Veprek, S., Mitzel, N.W., Schmidbaur, H.: Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and their Comparison with Methyltrichlorosilane. Chemistry of Materials. 7, 1675-1679 (1995).
Kunstmann, T., Angerer, H., Knecht, J., Veprek, S., Mitzel, Norbert W., and Schmidbaur, H. “Novel Brominated Carbosilane Precursors for Low-Temperature Heteroepitaxy of β-SiC and their Comparison with Methyltrichlorosilane”. Chemistry of Materials 7.9 (1995): 1675-1679.
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