X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist

Zharnikov, M.; Shaporenko, A.; Paul, A.; Gölzhäuser, Armin; Schow, A.

X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist

Zharnikov M, Shaporenko A, Paul A, Gölzhäuser A, Schow A (2005)
Journal of Physical Chemistry B 109(11): 5168-5174.

Zeitschriftenaufsatz | Veröffentlicht | Englisch

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DOI

https://doi.org/10.1021/jp040649g

Autor*in

Zharnikov, M.; Shaporenko, A.; Paul, A.; Gölzhäuser, Armin^UniBi ; Schow, A.

Einrichtung

Fakultät für Physik > AG Physik supramolekularer Systeme und Oberflächen

Erscheinungsjahr

2005

Zeitschriftentitel

Journal of Physical Chemistry B

Band

109

Ausgabe

11

Seite(n)

5168-5174

ISSN

1520-6106

eISSN

1520-5207

Page URI

https://pub.uni-bielefeld.de/record/1914584

Zitieren

Zharnikov M, Shaporenko A, Paul A, Gölzhäuser A, Schow A. X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B. 2005;109(11):5168-5174.

Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, A., & Schow, A. (2005). X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B, 109(11), 5168-5174. https://doi.org/10.1021/jp040649g

Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, Armin, and Schow, A. 2005. “X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist”. Journal of Physical Chemistry B 109 (11): 5168-5174.

Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, A., and Schow, A. (2005). X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B 109, 5168-5174.

Zharnikov, M., et al., 2005. X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B, 109(11), p 5168-5174.

M. Zharnikov, et al., “X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist”, Journal of Physical Chemistry B, vol. 109, 2005, pp. 5168-5174.

Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, A., Schow, A.: X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B. 109, 5168-5174 (2005).

Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, Armin, and Schow, A. “X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist”. Journal of Physical Chemistry B 109.11 (2005): 5168-5174.

Daten bereitgestellt von European Bioinformatics Institute (EBI)

3 Zitationen in Europe PMC

Daten bereitgestellt von Europe PubMed Central.

Amino-terminated biphenylthiol self-assembled monolayers as highly reactive molecular templates.
Meyerbroeker N, Waske P, Zharnikov M., J Chem Phys 142(10), 2015
PMID: 25770508

Fabrication of a full-coverage polymer nanobrush on an electron-beam-activated template.
Schilp S, Ballav N, Zharnikov M., Angew Chem Int Ed Engl 47(36), 2008
PMID: 18655093

Morphology control of structured polymer brushes.
Steenackers M, Küller A, Ballav N, Zharnikov M, Grunze M, Jordan R., Small 3(10), 2007
PMID: 17853498