X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist

Zharnikov M, Shaporenko A, Paul A, Gölzhäuser A, Schow A (2005)
Journal of Physical Chemistry B 109(11): 5168-5174.

Zeitschriftenaufsatz | Veröffentlicht | Englisch
 
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DOI
Autor*in
Zharnikov, M.; Shaporenko, A.; Paul, A.; Gölzhäuser, ArminUniBi ; Schow, A.
Einrichtung
Fakultät für Physik > AG Physik supramolekularer Systeme und Oberflächen
Erscheinungsjahr
2005
Zeitschriftentitel
Journal of Physical Chemistry B
Band
109
Ausgabe
11
Seite(n)
5168-5174
ISSN
1520-6106
eISSN
1520-5207
Page URI
https://pub.uni-bielefeld.de/record/1914584

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Zharnikov M, Shaporenko A, Paul A, Gölzhäuser A, Schow A. X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B. 2005;109(11):5168-5174.
Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, A., & Schow, A. (2005). X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B, 109(11), 5168-5174. https://doi.org/10.1021/jp040649g
Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, Armin, and Schow, A. 2005. “X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist”. Journal of Physical Chemistry B 109 (11): 5168-5174.
Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, A., and Schow, A. (2005). X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B 109, 5168-5174.
Zharnikov, M., et al., 2005. X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B, 109(11), p 5168-5174.
M. Zharnikov, et al., “X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist”, Journal of Physical Chemistry B, vol. 109, 2005, pp. 5168-5174.
Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, A., Schow, A.: X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B. 109, 5168-5174 (2005).
Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, Armin, and Schow, A. “X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist”. Journal of Physical Chemistry B 109.11 (2005): 5168-5174.

3 Zitationen in Europe PMC

Daten bereitgestellt von Europe PubMed Central.

Amino-terminated biphenylthiol self-assembled monolayers as highly reactive molecular templates.
Meyerbroeker N, Waske P, Zharnikov M., J Chem Phys 142(10), 2015
PMID: 25770508
Fabrication of a full-coverage polymer nanobrush on an electron-beam-activated template.
Schilp S, Ballav N, Zharnikov M., Angew Chem Int Ed Engl 47(36), 2008
PMID: 18655093
Morphology control of structured polymer brushes.
Steenackers M, Küller A, Ballav N, Zharnikov M, Grunze M, Jordan R., Small 3(10), 2007
PMID: 17853498
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