Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS

Heidemann B, Tappe T, Schmiedeskamp B, Heinzmann U (1994)
Applied Surface Science 78(2): 133-140.

Zeitschriftenaufsatz | Veröffentlicht | Englisch
 
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Autor*in
Heidemann, B.; Tappe, T.; Schmiedeskamp, B.; Heinzmann, UlrichUniBi
Erscheinungsjahr
1994
Zeitschriftentitel
Applied Surface Science
Band
78
Ausgabe
2
Seite(n)
133-140
ISSN
0169-4332
Page URI
https://pub.uni-bielefeld.de/record/1780462

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Heidemann B, Tappe T, Schmiedeskamp B, Heinzmann U. Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS. Applied Surface Science. 1994;78(2):133-140.
Heidemann, B., Tappe, T., Schmiedeskamp, B., & Heinzmann, U. (1994). Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS. Applied Surface Science, 78(2), 133-140. https://doi.org/10.1016/0169-4332(94)00114-6
Heidemann, B., Tappe, T., Schmiedeskamp, B., and Heinzmann, U. (1994). Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS. Applied Surface Science 78, 133-140.
Heidemann, B., et al., 1994. Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS. Applied Surface Science, 78(2), p 133-140.
B. Heidemann, et al., “Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS”, Applied Surface Science, vol. 78, 1994, pp. 133-140.
Heidemann, B., Tappe, T., Schmiedeskamp, B., Heinzmann, U.: Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS. Applied Surface Science. 78, 133-140 (1994).
Heidemann, B., Tappe, T., Schmiedeskamp, B., and Heinzmann, Ulrich. “Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS”. Applied Surface Science 78.2 (1994): 133-140.
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