Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment
Kloidt A, Stock HJ, Kleineberg U, Döhring T, Pröpper M, Schmiedeskamp B, Heinzmann U (1993)
Thin Solid Films 228(1-2): 154-157.
Zeitschriftenaufsatz
| Veröffentlicht | Englisch
Download
Autor*in
Kloidt, A.;
Stock, H. J.;
Kleineberg, U.;
Döhring, T.;
Pröpper, M.;
Schmiedeskamp, B.;
Heinzmann, UlrichUniBi
Abstract / Bemerkung
Mo/Si multilayers with a bilayer thickness of 2.6 nm are produced by electron beam evaporation in ultrahigh vacuum for soft X-ray optical applications. High reflectivities resulting from constructive interference in the stack are limited by the optical constants of the materials and by the quality of the interfaces. Smoothing of the boundaries is obtained by bombardment of the deposited layers with Ar+ ions. The smoothness of the interfaces is controlled during the deposition by in situ measurement of the reflectivity for the C K radiation of the stack and after completion of the stack by means of a grazing X-ray reflection set-up with Cu K[Alpha] radiation. The soft X-ray reflectivity is measured with a laser-induced plasma light source.
Erscheinungsjahr
1993
Zeitschriftentitel
Thin Solid Films
Band
228
Ausgabe
1-2
Seite(n)
154-157
ISSN
0040-6090
Page URI
https://pub.uni-bielefeld.de/record/1780402
Zitieren
Kloidt A, Stock HJ, Kleineberg U, et al. Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment. Thin Solid Films. 1993;228(1-2):154-157.
Kloidt, A., Stock, H. J., Kleineberg, U., Döhring, T., Pröpper, M., Schmiedeskamp, B., & Heinzmann, U. (1993). Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment. Thin Solid Films, 228(1-2), 154-157. https://doi.org/10.1016/0040-6090(93)90586-E
Kloidt, A., Stock, H. J., Kleineberg, U., Döhring, T., Pröpper, M., Schmiedeskamp, B., and Heinzmann, Ulrich. 1993. “Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment”. Thin Solid Films 228 (1-2): 154-157.
Kloidt, A., Stock, H. J., Kleineberg, U., Döhring, T., Pröpper, M., Schmiedeskamp, B., and Heinzmann, U. (1993). Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment. Thin Solid Films 228, 154-157.
Kloidt, A., et al., 1993. Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment. Thin Solid Films, 228(1-2), p 154-157.
A. Kloidt, et al., “Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment”, Thin Solid Films, vol. 228, 1993, pp. 154-157.
Kloidt, A., Stock, H.J., Kleineberg, U., Döhring, T., Pröpper, M., Schmiedeskamp, B., Heinzmann, U.: Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment. Thin Solid Films. 228, 154-157 (1993).
Kloidt, A., Stock, H. J., Kleineberg, U., Döhring, T., Pröpper, M., Schmiedeskamp, B., and Heinzmann, Ulrich. “Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment”. Thin Solid Films 228.1-2 (1993): 154-157.
Alle Dateien verfügbar unter der/den folgenden Lizenz(en):
Copyright Statement:
Dieses Objekt ist durch das Urheberrecht und/oder verwandte Schutzrechte geschützt. [...]
Volltext(e)
Name
Access Level
Open Access
Zuletzt Hochgeladen
2019-09-06T08:48:32Z
MD5 Prüfsumme
5f2a57ae9500a6a32029936768c84e69
Export
Markieren/ Markierung löschen
Markierte Publikationen
Web of Science
Dieser Datensatz im Web of Science®Suchen in
Google Scholar