Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment
Kloidt A, Nolting K, Kleineberg U, Schmiedeskamp B, Heinzmann U, Müller P, Kühne M (1991)
Applied Physics Letters 58(23): 2601-2603.
Zeitschriftenaufsatz
| Veröffentlicht | Englisch
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Autor*in
Kloidt, A.;
Nolting, K.;
Kleineberg, U.;
Schmiedeskamp, B.;
Heinzmann, UlrichUniBi;
Müller, P.;
Kühne, M.
Abstract / Bemerkung
Thermal treatment of a Mo/Si multilayer stack enhances its reflectivity in the soft x-ray region. The multilayer x-ray mirrors are fabricated by electron beam evaporation in ultrahigh vacuum. In situ measurement of the reflectivity during the deposition allows thickness control and an observation of changes in quality of the boundaries. By heating the substrates during deposition we obtain a smoothing of the interfaces. This leads to x-ray mirrors with peak reflectivity around 50% for normal incident radiation of wavelengths between 130 and 140 A.
Erscheinungsjahr
1991
Zeitschriftentitel
Applied Physics Letters
Band
58
Ausgabe
23
Seite(n)
2601-2603
ISSN
0003-6951
Page URI
https://pub.uni-bielefeld.de/record/1780328
Zitieren
Kloidt A, Nolting K, Kleineberg U, et al. Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment. Applied Physics Letters. 1991;58(23):2601-2603.
Kloidt, A., Nolting, K., Kleineberg, U., Schmiedeskamp, B., Heinzmann, U., Müller, P., & Kühne, M. (1991). Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment. Applied Physics Letters, 58(23), 2601-2603. https://doi.org/10.1063/1.104835
Kloidt, A., Nolting, K., Kleineberg, U., Schmiedeskamp, B., Heinzmann, Ulrich, Müller, P., and Kühne, M. 1991. “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment”. Applied Physics Letters 58 (23): 2601-2603.
Kloidt, A., Nolting, K., Kleineberg, U., Schmiedeskamp, B., Heinzmann, U., Müller, P., and Kühne, M. (1991). Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment. Applied Physics Letters 58, 2601-2603.
Kloidt, A., et al., 1991. Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment. Applied Physics Letters, 58(23), p 2601-2603.
A. Kloidt, et al., “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment”, Applied Physics Letters, vol. 58, 1991, pp. 2601-2603.
Kloidt, A., Nolting, K., Kleineberg, U., Schmiedeskamp, B., Heinzmann, U., Müller, P., Kühne, M.: Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment. Applied Physics Letters. 58, 2601-2603 (1991).
Kloidt, A., Nolting, K., Kleineberg, U., Schmiedeskamp, B., Heinzmann, Ulrich, Müller, P., and Kühne, M. “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment”. Applied Physics Letters 58.23 (1991): 2601-2603.
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