A laser-generated plasma as a source of VUV continuum radiation for photoelectronic spectroscopy

Heckenkamp C, Heinzmann U, Schönhense G, Burgess DD, Thorne AP, Wheaton JEG (1981)
Journal of Physics D: Applied Physics 14(12): L203-L206.

Zeitschriftenaufsatz | Veröffentlicht| Englisch
 
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Autor*in
Heckenkamp, Ch.; Heinzmann, UlrichUniBi; Schönhense, G.; Burgess, D. D.; Thorne, A. P.; Wheaton, J. E. G.
Abstract / Bemerkung
The feasibility of using laser-generated plasmas as VUV continuum sources for photoelectron spectroscopy has been demonstrated by measuring the spectral intensity distribution of the VUV continuum in the wavelength region from 79 to 43 nm by energy analysis of the photoelectrons ejected from argon atoms. The maximum photon flux obtained after reflection at a gold-coated spherical mirror was of the order of 10(11) photons nm(-1) per pulse at 50 nm for a laser energy of 830 mJ. The results show a shift of the emission maximum to lower wavelengths with increasing laser energy.
Erscheinungsjahr
1981
Zeitschriftentitel
Journal of Physics D: Applied Physics
Band
14
Ausgabe
12
Seite(n)
L203-L206
ISSN
0022-3727
eISSN
1361-6463
Page URI
https://pub.uni-bielefeld.de/record/1775461

Zitieren

Heckenkamp C, Heinzmann U, Schönhense G, Burgess DD, Thorne AP, Wheaton JEG. A laser-generated plasma as a source of VUV continuum radiation for photoelectronic spectroscopy. Journal of Physics D: Applied Physics. 1981;14(12):L203-L206.
Heckenkamp, C., Heinzmann, U., Schönhense, G., Burgess, D. D., Thorne, A. P., & Wheaton, J. E. G. (1981). A laser-generated plasma as a source of VUV continuum radiation for photoelectronic spectroscopy. Journal of Physics D: Applied Physics, 14(12), L203-L206. doi:10.1088/0022-3727/14/12/002
Heckenkamp, C., Heinzmann, U., Schönhense, G., Burgess, D. D., Thorne, A. P., and Wheaton, J. E. G. (1981). A laser-generated plasma as a source of VUV continuum radiation for photoelectronic spectroscopy. Journal of Physics D: Applied Physics 14, L203-L206.
Heckenkamp, C., et al., 1981. A laser-generated plasma as a source of VUV continuum radiation for photoelectronic spectroscopy. Journal of Physics D: Applied Physics, 14(12), p L203-L206.
C. Heckenkamp, et al., “A laser-generated plasma as a source of VUV continuum radiation for photoelectronic spectroscopy”, Journal of Physics D: Applied Physics, vol. 14, 1981, pp. L203-L206.
Heckenkamp, C., Heinzmann, U., Schönhense, G., Burgess, D.D., Thorne, A.P., Wheaton, J.E.G.: A laser-generated plasma as a source of VUV continuum radiation for photoelectronic spectroscopy. Journal of Physics D: Applied Physics. 14, L203-L206 (1981).
Heckenkamp, Ch., Heinzmann, Ulrich, Schönhense, G., Burgess, D. D., Thorne, A. P., and Wheaton, J. E. G. “A laser-generated plasma as a source of VUV continuum radiation for photoelectronic spectroscopy”. Journal of Physics D: Applied Physics 14.12 (1981): L203-L206.
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