Ultrahigh vacuum scanning-tunneling microscope for in situ studies of annealing and electromigration behavior of thin films
Reiss G, Levine LE, Smith DA (1993)
Journal of Vacuum Science and Technology, B: Microelectronics and Nanometer Structures 11(1): 108-111.
Zeitschriftenaufsatz
| Veröffentlicht | Englisch
Download
Autor*in
Reiss, GünterUniBi
;
Levine, L. E.;
Smith, D. A.
![](https://pub.uni-bielefeld.de/images/icon_orcid.png)
Abstract / Bemerkung
High resolution in situ imaging of metal surfaces during annealing and/or current transport is of great interest both for the application of metal lines in electronic devices and for extending our basic knowledge of the related complex physical phenomena. Due to its high resolution, the scanning tunneling microscope (STM) is a promising tool for in situ investigations of the structural changes of metals with respect to temperature (annealing) and current transport (electromigration). In this article, the instrumental modifications necessary for in situ scanning tunneling microscopy of heated and/or current carrying thin films under ultrahigh vacuum conditions are discussed. Using results obtained on Ag films, the ability of our STM to image the surface dynamically is demonstrated, while structural changes induced by the current transport are taking place.
Stichworte
Electrophoresis;
Ultrahigh vacuum;
Scanning tunneling microscopy;
Silver scanning;
Images;
Thin films;
Annealing;
Surface structure
Erscheinungsjahr
1993
Zeitschriftentitel
Journal of Vacuum Science and Technology, B: Microelectronics and Nanometer Structures
Band
11
Ausgabe
1
Seite(n)
108-111
ISSN
0734-211X
Page URI
https://pub.uni-bielefeld.de/record/1775386
Zitieren
Reiss G, Levine LE, Smith DA. Ultrahigh vacuum scanning-tunneling microscope for in situ studies of annealing and electromigration behavior of thin films. Journal of Vacuum Science and Technology, B: Microelectronics and Nanometer Structures. 1993;11(1):108-111.
Reiss, G., Levine, L. E., & Smith, D. A. (1993). Ultrahigh vacuum scanning-tunneling microscope for in situ studies of annealing and electromigration behavior of thin films. Journal of Vacuum Science and Technology, B: Microelectronics and Nanometer Structures, 11(1), 108-111. https://doi.org/10.1116/1.586709
Reiss, Günter, Levine, L. E., and Smith, D. A. 1993. “Ultrahigh vacuum scanning-tunneling microscope for in situ studies of annealing and electromigration behavior of thin films”. Journal of Vacuum Science and Technology, B: Microelectronics and Nanometer Structures 11 (1): 108-111.
Reiss, G., Levine, L. E., and Smith, D. A. (1993). Ultrahigh vacuum scanning-tunneling microscope for in situ studies of annealing and electromigration behavior of thin films. Journal of Vacuum Science and Technology, B: Microelectronics and Nanometer Structures 11, 108-111.
Reiss, G., Levine, L.E., & Smith, D.A., 1993. Ultrahigh vacuum scanning-tunneling microscope for in situ studies of annealing and electromigration behavior of thin films. Journal of Vacuum Science and Technology, B: Microelectronics and Nanometer Structures, 11(1), p 108-111.
G. Reiss, L.E. Levine, and D.A. Smith, “Ultrahigh vacuum scanning-tunneling microscope for in situ studies of annealing and electromigration behavior of thin films”, Journal of Vacuum Science and Technology, B: Microelectronics and Nanometer Structures, vol. 11, 1993, pp. 108-111.
Reiss, G., Levine, L.E., Smith, D.A.: Ultrahigh vacuum scanning-tunneling microscope for in situ studies of annealing and electromigration behavior of thin films. Journal of Vacuum Science and Technology, B: Microelectronics and Nanometer Structures. 11, 108-111 (1993).
Reiss, Günter, Levine, L. E., and Smith, D. A. “Ultrahigh vacuum scanning-tunneling microscope for in situ studies of annealing and electromigration behavior of thin films”. Journal of Vacuum Science and Technology, B: Microelectronics and Nanometer Structures 11.1 (1993): 108-111.
Alle Dateien verfügbar unter der/den folgenden Lizenz(en):
Copyright Statement:
Dieses Objekt ist durch das Urheberrecht und/oder verwandte Schutzrechte geschützt. [...]
Volltext(e)
Name
Access Level
![Open access file OA](https://pub.uni-bielefeld.de/images/access_open.png)
Zuletzt Hochgeladen
2019-09-06T08:48:17Z
MD5 Prüfsumme
e0ad99a7e89d26536e6bf3fc128056f7
Export
Markieren/ Markierung löschen
Markierte Publikationen
Web of Science
Dieser Datensatz im Web of Science®Suchen in