X-RAY AND AUGER-ELECTRON YIELDS FOR QUANTITATIVE ELEMENT ANALYSIS
JITSCHIN W, Werner U (1987)
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 5(4): 1203-1205.
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Autor*in
JITSCHIN, W;
Werner, UdoUniBi
Erscheinungsjahr
1987
Zeitschriftentitel
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
Band
5
Ausgabe
4
Seite(n)
1203-1205
ISSN
0734-2101
Page URI
https://pub.uni-bielefeld.de/record/1655229
Zitieren
JITSCHIN W, Werner U. X-RAY AND AUGER-ELECTRON YIELDS FOR QUANTITATIVE ELEMENT ANALYSIS. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS. 1987;5(4):1203-1205.
JITSCHIN, W., & Werner, U. (1987). X-RAY AND AUGER-ELECTRON YIELDS FOR QUANTITATIVE ELEMENT ANALYSIS. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 5(4), 1203-1205. https://doi.org/10.1116/1.574640
JITSCHIN, W, and Werner, Udo. 1987. “X-RAY AND AUGER-ELECTRON YIELDS FOR QUANTITATIVE ELEMENT ANALYSIS”. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 5 (4): 1203-1205.
JITSCHIN, W., and Werner, U. (1987). X-RAY AND AUGER-ELECTRON YIELDS FOR QUANTITATIVE ELEMENT ANALYSIS. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 5, 1203-1205.
JITSCHIN, W., & Werner, U., 1987. X-RAY AND AUGER-ELECTRON YIELDS FOR QUANTITATIVE ELEMENT ANALYSIS. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 5(4), p 1203-1205.
W. JITSCHIN and U. Werner, “X-RAY AND AUGER-ELECTRON YIELDS FOR QUANTITATIVE ELEMENT ANALYSIS”, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, vol. 5, 1987, pp. 1203-1205.
JITSCHIN, W., Werner, U.: X-RAY AND AUGER-ELECTRON YIELDS FOR QUANTITATIVE ELEMENT ANALYSIS. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS. 5, 1203-1205 (1987).
JITSCHIN, W, and Werner, Udo. “X-RAY AND AUGER-ELECTRON YIELDS FOR QUANTITATIVE ELEMENT ANALYSIS”. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 5.4 (1987): 1203-1205.
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