Alcohol-assisted CVD of silver using commercially available precursors
Bahlawane N, Premkumar PA, Brechling A, Reiss G, Kohse-Höinghaus K (2007)
CHEMICAL VAPOR DEPOSITION 13(8): 401-407.
Zeitschriftenaufsatz
| Veröffentlicht | Englisch
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Autor*in
Bahlawane, NaoufalUniBi
;
Premkumar, Peter Antony;
Brechling, ArminUniBi;
Reiss, GünterUniBi
;
Kohse-Höinghaus, KatharinaUniBi
![](https://pub.uni-bielefeld.de/images/icon_orcid.png)
![](https://pub.uni-bielefeld.de/images/icon_orcid.png)
Einrichtung
Fakultät für Chemie > Physikalische Chemie I
Centrum für Biotechnologie > Arbeitsgruppe G. Reiss
Fakultät für Physik > AG Dünne Schichten & Physik der Nanostrukturen
Centrum für Biotechnologie > Institut für Biophysik und Nanowissenschaften
Fakultät für Physik > Lehrstuhl für Molekül- und Oberflächenphysik
Centrum für Biotechnologie > Arbeitsgruppe G. Reiss
Fakultät für Physik > AG Dünne Schichten & Physik der Nanostrukturen
Centrum für Biotechnologie > Institut für Biophysik und Nanowissenschaften
Fakultät für Physik > Lehrstuhl für Molekül- und Oberflächenphysik
Abstract / Bemerkung
A novel chemical approach was demonstrated for the growth of high-quality, silver films by CVD. This concept relies on the catalytic reactivity of cationic silver, and of silver surfaces with alcohols. This leads to high-purity films using either state-of-the-art precursors or silver salts that have not been yet considered as CVD precursors. The occurrence of the catalytic oxidative-dehvdrogenation of alcohols, considered as the driving force in this process, was shown by in-situ mass spectrometry (MS). Films of fcc-Ag with p <= 2 mu Omega cm were grown without any noticeable contamination. Ag(hfac)COD leads to the growth of a (111) highly orientated film on glass at a rate of 1.66 nm min(-1), while polycrystalline films are grown at a rate of 18.5 run min(-1) using AgNO3.
Stichworte
electrical resistivity;
metallization;
liquid delivery;
silver films;
pulsed-spray-evaporation CVD
Erscheinungsjahr
2007
Zeitschriftentitel
CHEMICAL VAPOR DEPOSITION
Band
13
Ausgabe
8
Seite(n)
401-407
ISSN
0948-1907
eISSN
1521-3862
Page URI
https://pub.uni-bielefeld.de/record/1632872
Zitieren
Bahlawane N, Premkumar PA, Brechling A, Reiss G, Kohse-Höinghaus K. Alcohol-assisted CVD of silver using commercially available precursors. CHEMICAL VAPOR DEPOSITION. 2007;13(8):401-407.
Bahlawane, N., Premkumar, P. A., Brechling, A., Reiss, G., & Kohse-Höinghaus, K. (2007). Alcohol-assisted CVD of silver using commercially available precursors. CHEMICAL VAPOR DEPOSITION, 13(8), 401-407. https://doi.org/10.1002/cvde.200706610
Bahlawane, Naoufal, Premkumar, Peter Antony, Brechling, Armin, Reiss, Günter, and Kohse-Höinghaus, Katharina. 2007. “Alcohol-assisted CVD of silver using commercially available precursors”. CHEMICAL VAPOR DEPOSITION 13 (8): 401-407.
Bahlawane, N., Premkumar, P. A., Brechling, A., Reiss, G., and Kohse-Höinghaus, K. (2007). Alcohol-assisted CVD of silver using commercially available precursors. CHEMICAL VAPOR DEPOSITION 13, 401-407.
Bahlawane, N., et al., 2007. Alcohol-assisted CVD of silver using commercially available precursors. CHEMICAL VAPOR DEPOSITION, 13(8), p 401-407.
N. Bahlawane, et al., “Alcohol-assisted CVD of silver using commercially available precursors”, CHEMICAL VAPOR DEPOSITION, vol. 13, 2007, pp. 401-407.
Bahlawane, N., Premkumar, P.A., Brechling, A., Reiss, G., Kohse-Höinghaus, K.: Alcohol-assisted CVD of silver using commercially available precursors. CHEMICAL VAPOR DEPOSITION. 13, 401-407 (2007).
Bahlawane, Naoufal, Premkumar, Peter Antony, Brechling, Armin, Reiss, Günter, and Kohse-Höinghaus, Katharina. “Alcohol-assisted CVD of silver using commercially available precursors”. CHEMICAL VAPOR DEPOSITION 13.8 (2007): 401-407.
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