Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithography
Turchanin A, Schnietz M, El-Desawy M, Solak HH, David C, Gölzhäuser A (2007)
Small 3(12): 2114-2119.
Zeitschriftenaufsatz
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Autor*in
Turchanin, AndreyUniBi;
Schnietz, MarkUniBi;
El-Desawy, Mohamed;
Solak, Harun H.;
David, Christian;
Gölzhäuser, ArminUniBi 
Einrichtung
Abstract / Bemerkung
Extreme-UV interference lithography (EUV-IL) is applied to create chemical nanopatterns in self-assembled monolayers (SAMs) of 4'-nitro-1,1'-biphenyl-4-thiol (NBPT) on gold. X-ray photoelectron spectroscopy shows that EUV irradiation induces both the conversion of the terminal nitro groups of NBPT into amino gro ups and the lateral crosslinking of the underlying aromatic cores. Large-area (approximate to 2 mm(2)) nitro/amino chemical patterns with periods ranging from 2000 nm to 60 nm can be generated. Regions of pristine NBPT on the exposed samples are exchanged with protein-resistant thiol SAMs of polyethyleneglycol, resulting in the formation of molecular nanotemplates, which can serve as the basis of complex biomimetic surfaces.
Stichworte
chemical nanopatterns;
nanolithography;
biomimetics;
self-assembled monolayers;
molecular engineering
Erscheinungsjahr
2007
Zeitschriftentitel
Small
Band
3
Ausgabe
12
Seite(n)
2114-2119
ISSN
1613-6810
eISSN
1613-6829
Page URI
https://pub.uni-bielefeld.de/record/1631011
Zitieren
Turchanin A, Schnietz M, El-Desawy M, Solak HH, David C, Gölzhäuser A. Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithography. Small. 2007;3(12):2114-2119.
Turchanin, A., Schnietz, M., El-Desawy, M., Solak, H. H., David, C., & Gölzhäuser, A. (2007). Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithography. Small, 3(12), 2114-2119. https://doi.org/10.1002/smll.200700516
Turchanin, Andrey, Schnietz, Mark, El-Desawy, Mohamed, Solak, Harun H., David, Christian, and Gölzhäuser, Armin. 2007. “Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithography”. Small 3 (12): 2114-2119.
Turchanin, A., Schnietz, M., El-Desawy, M., Solak, H. H., David, C., and Gölzhäuser, A. (2007). Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithography. Small 3, 2114-2119.
Turchanin, A., et al., 2007. Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithography. Small, 3(12), p 2114-2119.
A. Turchanin, et al., “Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithography”, Small, vol. 3, 2007, pp. 2114-2119.
Turchanin, A., Schnietz, M., El-Desawy, M., Solak, H.H., David, C., Gölzhäuser, A.: Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithography. Small. 3, 2114-2119 (2007).
Turchanin, Andrey, Schnietz, Mark, El-Desawy, Mohamed, Solak, Harun H., David, Christian, and Gölzhäuser, Armin. “Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithography”. Small 3.12 (2007): 2114-2119.
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