Mossbauer study of the influence of thermal treatment on giant magnetoresistance and interface structure in Fe/Cr multilayers

Kopcewicz M, Lucinski T, Stobiecki F, Reiss G (1999)
In: Journal of Applied Physics. JOURNAL OF APPLIED PHYSICS, 85(8). AMER INST PHYSICS: 5039-5041.

Konferenzbeitrag | Veröffentlicht | Englisch
 
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Autor*in
Kopcewicz, M; Lucinski, T; Stobiecki, F; Reiss, GünterUniBi
Abstract / Bemerkung
The dependence of the giant magnetoresistance effect (GMR) on the interface structure in Fe/Cr multilayers was studied by magnetoresistivity and Mossbauer spectroscopy. The Fe/Cr multilayers consisting of Fe(6 nm) + [Cr(1.1 nm)/Fe(3 nm)](60) + Cr(1.1 nm) were deposited by dc magnetron sputtering. Samples were annealed for 1 h at temperatures ranging from 200 to 500 degrees C. The interface structure was characterized by conversion electron Mossbauer spectroscopy (CEMS). Various different Fe sites: the bulk, step and perfect interface positions were identified. The evolution of the fraction of Fe atoms in different environments vs annealing temperature revealed that annealing at 300 degrees C induces bulk and in-plane diffusion of atoms. Higher annealing temperature causes substantial roughening of the interface related to a strong bulk diffusion of atoms. Microstructural changes observed in the CEMS spectra correspond well to the GMR measurements which reveal an enhancement of magnetoresistivity in Fe/Cr multilayers annealed at about 300 degrees C and its decrease due to deterioration of the interface at higher annealing temperatures. (C) 1999 American Institute of Physics. [S0021-8979(99)19608-7].
Erscheinungsjahr
1999
Titel des Konferenzbandes
Journal of Applied Physics
Serien- oder Zeitschriftentitel
JOURNAL OF APPLIED PHYSICS
Band
85
Ausgabe
8
Seite(n)
5039-5041
ISSN
0021-8979
Page URI
https://pub.uni-bielefeld.de/record/1623159

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Kopcewicz M, Lucinski T, Stobiecki F, Reiss G. Mossbauer study of the influence of thermal treatment on giant magnetoresistance and interface structure in Fe/Cr multilayers. In: Journal of Applied Physics. JOURNAL OF APPLIED PHYSICS. Vol 85. AMER INST PHYSICS; 1999: 5039-5041.
Kopcewicz, M., Lucinski, T., Stobiecki, F., & Reiss, G. (1999). Mossbauer study of the influence of thermal treatment on giant magnetoresistance and interface structure in Fe/Cr multilayers. Journal of Applied Physics, JOURNAL OF APPLIED PHYSICS, 85, 5039-5041. AMER INST PHYSICS. https://doi.org/10.1063/1.370084
Kopcewicz, M, Lucinski, T, Stobiecki, F, and Reiss, Günter. 1999. “Mossbauer study of the influence of thermal treatment on giant magnetoresistance and interface structure in Fe/Cr multilayers”. In Journal of Applied Physics, 85:5039-5041. JOURNAL OF APPLIED PHYSICS. AMER INST PHYSICS.
Kopcewicz, M., Lucinski, T., Stobiecki, F., and Reiss, G. (1999). “Mossbauer study of the influence of thermal treatment on giant magnetoresistance and interface structure in Fe/Cr multilayers” in Journal of Applied Physics JOURNAL OF APPLIED PHYSICS, vol. 85, (AMER INST PHYSICS), 5039-5041.
Kopcewicz, M., et al., 1999. Mossbauer study of the influence of thermal treatment on giant magnetoresistance and interface structure in Fe/Cr multilayers. In Journal of Applied Physics. JOURNAL OF APPLIED PHYSICS. no.85 AMER INST PHYSICS, pp. 5039-5041.
M. Kopcewicz, et al., “Mossbauer study of the influence of thermal treatment on giant magnetoresistance and interface structure in Fe/Cr multilayers”, Journal of Applied Physics, JOURNAL OF APPLIED PHYSICS, vol. 85, AMER INST PHYSICS, 1999, pp.5039-5041.
Kopcewicz, M., Lucinski, T., Stobiecki, F., Reiss, G.: Mossbauer study of the influence of thermal treatment on giant magnetoresistance and interface structure in Fe/Cr multilayers. Journal of Applied Physics. JOURNAL OF APPLIED PHYSICS. 85, p. 5039-5041. AMER INST PHYSICS (1999).
Kopcewicz, M, Lucinski, T, Stobiecki, F, and Reiss, Günter. “Mossbauer study of the influence of thermal treatment on giant magnetoresistance and interface structure in Fe/Cr multilayers”. Journal of Applied Physics. AMER INST PHYSICS, 1999.Vol. 85. JOURNAL OF APPLIED PHYSICS. 5039-5041.
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