PUB - Publikationen an der Universität Bielefeld

Nanometer-scale lithography in amorphous carbon layers was carried out by locally oxidizing the carbon under the tip of a scanning probe microscope. Although this patterning technique is able to yield very small structures, its speed is severely limited due to the serial character of the writing process. We exploit the potential of local carbon oxidation to give a parallel lithography approach which uses prepatterned stamps for electron-induced parallel structuring of the carbon film. This technique allows the transfer of complex, three-dimensional patterns into a carbon resist layer within a single process step. (C) 2000 American Institute of Physics. [S0003-6951(00)02206-3].