Parallel nanolithography in carbon layers with conductive imprint stamps

Mühl T, Kretz J, Mönch I, Schneider CM, Brückl H, Reiss G (2000)
APPLIED PHYSICS LETTERS 76(6): 786-788.

Zeitschriftenaufsatz | Veröffentlicht | Englisch
 
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Autor*in
Mühl, T; Kretz, J; Mönch, I; Schneider, CM; Brückl, Hubert; Reiss, GünterUniBi
Abstract / Bemerkung
Nanometer-scale lithography in amorphous carbon layers was carried out by locally oxidizing the carbon under the tip of a scanning probe microscope. Although this patterning technique is able to yield very small structures, its speed is severely limited due to the serial character of the writing process. We exploit the potential of local carbon oxidation to give a parallel lithography approach which uses prepatterned stamps for electron-induced parallel structuring of the carbon film. This technique allows the transfer of complex, three-dimensional patterns into a carbon resist layer within a single process step. (C) 2000 American Institute of Physics. [S0003-6951(00)02206-3].
Erscheinungsjahr
2000
Zeitschriftentitel
APPLIED PHYSICS LETTERS
Band
76
Ausgabe
6
Seite(n)
786-788
ISSN
0003-6951
Page URI
https://pub.uni-bielefeld.de/record/1620718

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Mühl T, Kretz J, Mönch I, Schneider CM, Brückl H, Reiss G. Parallel nanolithography in carbon layers with conductive imprint stamps. APPLIED PHYSICS LETTERS. 2000;76(6):786-788.
Mühl, T., Kretz, J., Mönch, I., Schneider, C. M., Brückl, H., & Reiss, G. (2000). Parallel nanolithography in carbon layers with conductive imprint stamps. APPLIED PHYSICS LETTERS, 76(6), 786-788. doi:10.1063/1.125895
Mühl, T., Kretz, J., Mönch, I., Schneider, C. M., Brückl, H., and Reiss, G. (2000). Parallel nanolithography in carbon layers with conductive imprint stamps. APPLIED PHYSICS LETTERS 76, 786-788.
Mühl, T., et al., 2000. Parallel nanolithography in carbon layers with conductive imprint stamps. APPLIED PHYSICS LETTERS, 76(6), p 786-788.
T. Mühl, et al., “Parallel nanolithography in carbon layers with conductive imprint stamps”, APPLIED PHYSICS LETTERS, vol. 76, 2000, pp. 786-788.
Mühl, T., Kretz, J., Mönch, I., Schneider, C.M., Brückl, H., Reiss, G.: Parallel nanolithography in carbon layers with conductive imprint stamps. APPLIED PHYSICS LETTERS. 76, 786-788 (2000).
Mühl, T, Kretz, J, Mönch, I, Schneider, CM, Brückl, Hubert, and Reiss, Günter. “Parallel nanolithography in carbon layers with conductive imprint stamps”. APPLIED PHYSICS LETTERS 76.6 (2000): 786-788.