Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe

Schleiwies J, Schmitz G, Heitmann S, Hütten A (2001)
APPLIED PHYSICS LETTERS 78(22): 3439-3441.

Zeitschriftenaufsatz | Veröffentlicht | Englisch
 
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Autor*in
Schleiwies, J; Schmitz, G; Heitmann, S; Hütten, AndreasUniBi
Abstract / Bemerkung
Offering the possibility of improving data storage and magnetic sensoric, applications of giant magnetoresistance (GMR) in thin metallic films are of great interest. In order to study thermal reactions in such layered structures, atom probe tomography is used, which has been proven to perform a real three-dimensional analysis on the relevant length scale of several angstroms only. Co/Cu/Ni79Fe21 layered structures were deposited on tungsten substrate tips by ion beam sputtering and analyzed in the as-prepared state and after suitable heat treatments. After annealing at 250 degreesC for 30 min, Fe segregation at the Co/Cu interface inside the Co layer is clearly observed. This effect may be interpreted as an interface dusting potentially increasing the GMR. After annealing at 350 degreesC for 30 min, an additional Ni segregation inside Cu grain boundaries is observed. It is suggested that this segregation path forms the initial stage of pinhole formation and finally causes ferromagnetic bridges through the paramagnetic coupling layer. (C) 2001 American Institute of Physics.
Erscheinungsjahr
2001
Zeitschriftentitel
APPLIED PHYSICS LETTERS
Band
78
Ausgabe
22
Seite(n)
3439-3441
ISSN
0003-6951
Page URI
https://pub.uni-bielefeld.de/record/1617140

Zitieren

Schleiwies J, Schmitz G, Heitmann S, Hütten A. Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe. APPLIED PHYSICS LETTERS. 2001;78(22):3439-3441.
Schleiwies, J., Schmitz, G., Heitmann, S., & Hütten, A. (2001). Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe. APPLIED PHYSICS LETTERS, 78(22), 3439-3441. https://doi.org/10.1063/1.1374999
Schleiwies, J, Schmitz, G, Heitmann, S, and Hütten, Andreas. 2001. “Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe”. APPLIED PHYSICS LETTERS 78 (22): 3439-3441.
Schleiwies, J., Schmitz, G., Heitmann, S., and Hütten, A. (2001). Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe. APPLIED PHYSICS LETTERS 78, 3439-3441.
Schleiwies, J., et al., 2001. Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe. APPLIED PHYSICS LETTERS, 78(22), p 3439-3441.
J. Schleiwies, et al., “Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe”, APPLIED PHYSICS LETTERS, vol. 78, 2001, pp. 3439-3441.
Schleiwies, J., Schmitz, G., Heitmann, S., Hütten, A.: Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe. APPLIED PHYSICS LETTERS. 78, 3439-3441 (2001).
Schleiwies, J, Schmitz, G, Heitmann, S, and Hütten, Andreas. “Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe”. APPLIED PHYSICS LETTERS 78.22 (2001): 3439-3441.
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