PUB - Publikationen an der Universität Bielefeld

Chemical vapor deposition (CVD) is an important method to produce thin films on various substrate materials. Most work concentrates on the quality of the resulting materials and on the surface chemistry, while gas phase chemistry is often overlooked. The present article discusses the role of gas phase chemistry for CVD processes at high growth rates by analysing two deposition systems. In silicon CVD, the gas phase reactions reduce the growth rate, while diamond CVD is impossible without gas phase activation prior to deposition. In both cases, a fundamental knowledge of these gas phase processes assists in obtaining high growth rates and in optimizing the CVD process.