Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions
Thomas A, Brückl H, Sacher M, Schmalhorst J-M, Reiss G (2003)
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 21(5): 2120-2122.
Zeitschriftenaufsatz
| Veröffentlicht | Englisch
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Autor*in
Thomas, AndyUniBi ;
Brückl, Hubert;
Sacher, MarcUniBi;
Schmalhorst, Jan-MichaelUniBi ;
Reiss, GünterUniBi
Abstract / Bemerkung
The aluminum barrier in exchange biased (Mn-Ir/Co-Fe/AlOx/Py) magnetic tunnel junctions was formed by oxidation with an electron cyclotron resonance plasma source. This technique allows, in contrast to commonly used floating substrate, an independent control of the energy of the ions bombarding the Al film by adjusting a direct current bias voltage at the sample. Here,we show that low energy ions and oxidation times between 50 and 200 s lead to optimum barrier properties and a maximum tunnel magneto resistance (TMR) ratio of 46% at room temperature and 73% at 10 K. Shorter oxidation time gives underoxidized samples with strongly reduced TMR. Ions with energy above 30 eV turn out to strongly overoxidize the sample resulting in large junction resistance and reduced TMR values. (C) 2003 American Vacuum Society.
Erscheinungsjahr
2003
Zeitschriftentitel
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Band
21
Ausgabe
5
Seite(n)
2120-2122
ISSN
0734-211X
Page URI
https://pub.uni-bielefeld.de/record/1609873
Zitieren
Thomas A, Brückl H, Sacher M, Schmalhorst J-M, Reiss G. Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 2003;21(5):2120-2122.
Thomas, A., Brückl, H., Sacher, M., Schmalhorst, J. - M., & Reiss, G. (2003). Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 21(5), 2120-2122. https://doi.org/10.1116/1.1609480
Thomas, Andy, Brückl, Hubert, Sacher, Marc, Schmalhorst, Jan-Michael, and Reiss, Günter. 2003. “Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions”. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 21 (5): 2120-2122.
Thomas, A., Brückl, H., Sacher, M., Schmalhorst, J. - M., and Reiss, G. (2003). Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 21, 2120-2122.
Thomas, A., et al., 2003. Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 21(5), p 2120-2122.
A. Thomas, et al., “Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions”, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, vol. 21, 2003, pp. 2120-2122.
Thomas, A., Brückl, H., Sacher, M., Schmalhorst, J.-M., Reiss, G.: Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 21, 2120-2122 (2003).
Thomas, Andy, Brückl, Hubert, Sacher, Marc, Schmalhorst, Jan-Michael, and Reiss, Günter. “Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions”. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 21.5 (2003): 2120-2122.
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