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5 Publications

2007 | Conference Paper | PUB-ID: 1593514
Actinic inspection of EUVL mask blank defects by photoemission electron microscopy: Effect of inspection wavelength variation
Lin J, Neuhaeusler U, Slieh J, Brechling A, Heinzmann U, Weber N, Escher M, Merkel M, Oelsner A, Valdaitsev D, Schoenhense G, et al. (2007)
MICROELECTRONIC ENGINEERING 84(5-8): 1011-1014.
PUB | DOI | WoS
 
2007 | Journal Article | PUB-ID: 1631529
Self-catalyzed chemical vapor deposition method for the growth of device-quality metal thin films
Bahlawane N, Premkumar PA, Onwuka K, Kohse-Höinghaus K, Reiss G (2007)
MICROELECTRONIC ENGINEERING 84(11): 2481-2485.
PUB | DOI | WoS
 
2006 | Conference Paper | PUB-ID: 1599271
A new approach for actinic defect inspection of EUVL multilayer mask blanks: Standing wave photoemission electron microscopy
Neuhäusler U, Lin J, Oelsner A, Schicketanz M, Valdaitsev D, Slieh J, Weber N, Brzeska M, Wonisch A, Westerwalbesloh T, Brechling A, et al. (2006)
MICROELECTRONIC ENGINEERING 83(4-9): 680-683.
PUB | DOI | WoS
 
2003 | Journal Article | PUB-ID: 1773175
Size-dependent free solution DNA electrophoresis in structured microfluidic systems
Duong TT, Kim G, Ros R, Streek M, Schmid F, Brugger J, Anselmetti D, Ros A (2003)
Microelectronic Engineering 67-68(1): 905-912.
PUB | PDF | DOI | WoS
 
2000 | Journal Article | PUB-ID: 1618235
Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy
Dreeskornfeld L, Segler R, Haindl G, Wehmeyer O, Rahn S, Majkova E, Kleineberg U, Heinzmann U, Hudek P, Kostic I (2000)
MICROELECTRONIC ENGINEERING 54(3-4): 303-314.
PUB | DOI | WoS
 

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