Femtosecond laser materials processing of a-Si:H below the ablation threshold

Soleymanzadeh B, Beyer W, Luekermann F, Prunici P, Pfeiffer W, Stiebig H (2014)
MRS Proc. 1666.

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Soleymanzadeh B, Beyer W, Luekermann F, Prunici P, Pfeiffer W, Stiebig H. Femtosecond laser materials processing of a-Si:H below the ablation threshold. MRS Proc. 2014;1666.
Soleymanzadeh, B., Beyer, W., Luekermann, F., Prunici, P., Pfeiffer, W., & Stiebig, H. (2014). Femtosecond laser materials processing of a-Si:H below the ablation threshold. MRS Proc., 1666.
Soleymanzadeh, B., Beyer, W., Luekermann, F., Prunici, P., Pfeiffer, W., and Stiebig, H. (2014). Femtosecond laser materials processing of a-Si:H below the ablation threshold. MRS Proc. 1666.
Soleymanzadeh, B., et al., 2014. Femtosecond laser materials processing of a-Si:H below the ablation threshold. MRS Proc., 1666.
B. Soleymanzadeh, et al., “Femtosecond laser materials processing of a-Si:H below the ablation threshold”, MRS Proc., vol. 1666, 2014.
Soleymanzadeh, B., Beyer, W., Luekermann, F., Prunici, P., Pfeiffer, W., Stiebig, H.: Femtosecond laser materials processing of a-Si:H below the ablation threshold. MRS Proc. 1666, (2014).
Soleymanzadeh, Babak, Beyer, W., Luekermann, F., Prunici, P., Pfeiffer, W., and Stiebig, Helmut. “Femtosecond laser materials processing of a-Si:H below the ablation threshold”. MRS Proc. 1666 (2014).
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