HIGH AND LOW-VOLTAGE ELECTRON-BEAM EXPOSURE OF TRICOSANOIC ACID MULTILAYERS

MERTIG M, KIRK ECG, MONCH I, BERTRAM M, EDELMANN J, SCHUMANN J, VANLOYEN L, GLADUN A, Reiss G (1995)
Physica B Condensed Matter 210(3-4): 468-471.

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Abstract
Monomolecular resist films of tricosanoic acid prepared on top of thin Au- and Pt-films by the Langmuir-Blodgett technique have been exposed by high and low voltage electron beams. Up to now patterns have been obtained with a line width down to about 100 nm. For a 10-monolayer resist successful pattern transfer into an 80 nm Au-film has been demonstrated.
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MERTIG M, KIRK ECG, MONCH I, et al. HIGH AND LOW-VOLTAGE ELECTRON-BEAM EXPOSURE OF TRICOSANOIC ACID MULTILAYERS. Physica B Condensed Matter. 1995;210(3-4):468-471.
MERTIG, M., KIRK, E. C. G., MONCH, I., BERTRAM, M., EDELMANN, J., SCHUMANN, J., VANLOYEN, L., et al. (1995). HIGH AND LOW-VOLTAGE ELECTRON-BEAM EXPOSURE OF TRICOSANOIC ACID MULTILAYERS. Physica B Condensed Matter, 210(3-4), 468-471.
MERTIG, M., KIRK, E. C. G., MONCH, I., BERTRAM, M., EDELMANN, J., SCHUMANN, J., VANLOYEN, L., GLADUN, A., and Reiss, G. (1995). HIGH AND LOW-VOLTAGE ELECTRON-BEAM EXPOSURE OF TRICOSANOIC ACID MULTILAYERS. Physica B Condensed Matter 210, 468-471.
MERTIG, M., et al., 1995. HIGH AND LOW-VOLTAGE ELECTRON-BEAM EXPOSURE OF TRICOSANOIC ACID MULTILAYERS. Physica B Condensed Matter, 210(3-4), p 468-471.
M. MERTIG, et al., “HIGH AND LOW-VOLTAGE ELECTRON-BEAM EXPOSURE OF TRICOSANOIC ACID MULTILAYERS”, Physica B Condensed Matter, vol. 210, 1995, pp. 468-471.
MERTIG, M., KIRK, E.C.G., MONCH, I., BERTRAM, M., EDELMANN, J., SCHUMANN, J., VANLOYEN, L., GLADUN, A., Reiss, G.: HIGH AND LOW-VOLTAGE ELECTRON-BEAM EXPOSURE OF TRICOSANOIC ACID MULTILAYERS. Physica B Condensed Matter. 210, 468-471 (1995).
MERTIG, M, KIRK, ECG, MONCH, I, BERTRAM, M, EDELMANN, J, SCHUMANN, J, VANLOYEN, L, GLADUN, A, and Reiss, Günter. “HIGH AND LOW-VOLTAGE ELECTRON-BEAM EXPOSURE OF TRICOSANOIC ACID MULTILAYERS”. Physica B Condensed Matter 210.3-4 (1995): 468-471.
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