Development of mechanical stress in sputtered Cr3Si films during annealing

Bruckner W, Weise G, Mattern N, Reiss G (1996)
Journal of Materials Science Letters 15(22): 1935-1937.

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Bruckner W, Weise G, Mattern N, Reiss G. Development of mechanical stress in sputtered Cr3Si films during annealing. Journal of Materials Science Letters. 1996;15(22):1935-1937.
Bruckner, W., Weise, G., Mattern, N., & Reiss, G. (1996). Development of mechanical stress in sputtered Cr3Si films during annealing. Journal of Materials Science Letters, 15(22), 1935-1937.
Bruckner, W., Weise, G., Mattern, N., and Reiss, G. (1996). Development of mechanical stress in sputtered Cr3Si films during annealing. Journal of Materials Science Letters 15, 1935-1937.
Bruckner, W., et al., 1996. Development of mechanical stress in sputtered Cr3Si films during annealing. Journal of Materials Science Letters, 15(22), p 1935-1937.
W. Bruckner, et al., “Development of mechanical stress in sputtered Cr3Si films during annealing”, Journal of Materials Science Letters, vol. 15, 1996, pp. 1935-1937.
Bruckner, W., Weise, G., Mattern, N., Reiss, G.: Development of mechanical stress in sputtered Cr3Si films during annealing. Journal of Materials Science Letters. 15, 1935-1937 (1996).
Bruckner, W, Weise, G, Mattern, N, and Reiss, Günter. “Development of mechanical stress in sputtered Cr3Si films during annealing”. Journal of Materials Science Letters 15.22 (1996): 1935-1937.
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