Photon-assisted tunneling versus tunneling of excited electrons in metal-insulator-metal junctions

Thon A, Klamroth T, Saalfrank P, Diesing D, Pfeiffer W (2004)
Appl. Phys. A 78(2): 189-199.

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Thon A, Klamroth T, Saalfrank P, Diesing D, Pfeiffer W. Photon-assisted tunneling versus tunneling of excited electrons in metal-insulator-metal junctions. Appl. Phys. A. 2004;78(2):189-199.
Thon, A., Klamroth, T., Saalfrank, P., Diesing, D., & Pfeiffer, W. (2004). Photon-assisted tunneling versus tunneling of excited electrons in metal-insulator-metal junctions. Appl. Phys. A, 78(2), 189-199.
Thon, A., Klamroth, T., Saalfrank, P., Diesing, D., and Pfeiffer, W. (2004). Photon-assisted tunneling versus tunneling of excited electrons in metal-insulator-metal junctions. Appl. Phys. A 78, 189-199.
Thon, A., et al., 2004. Photon-assisted tunneling versus tunneling of excited electrons in metal-insulator-metal junctions. Appl. Phys. A, 78(2), p 189-199.
A. Thon, et al., “Photon-assisted tunneling versus tunneling of excited electrons in metal-insulator-metal junctions”, Appl. Phys. A, vol. 78, 2004, pp. 189-199.
Thon, A., Klamroth, T., Saalfrank, P., Diesing, D., Pfeiffer, W.: Photon-assisted tunneling versus tunneling of excited electrons in metal-insulator-metal junctions. Appl. Phys. A. 78, 189-199 (2004).
Thon, A., Klamroth, T., Saalfrank, P., Diesing, D., and Pfeiffer, Walter. “Photon-assisted tunneling versus tunneling of excited electrons in metal-insulator-metal junctions”. Appl. Phys. A 78.2 (2004): 189-199.
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