Magnetoresistance and ion bombardment induced magnetic patterning

Höink V (2008)
Bielefeld (Germany): Bielefeld University.

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Bielefelder E-Dissertation | Englisch
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In this thesis the combination of the magnetic patterning of the unidirectional anisotropy and the tunnel magnetoresistance effect is investigated. In my diploma thesis, it has been shown that it is in principle possible to use the magnetic patterning by ion bombardment to magnetically structure the pinned layer in magnetic tunnel junctions (MTJs) with alumina barrier. Furthermore, it has been shown that the side effects which have been observed after this treatment can be at least reduced by an additional heating step. Starting from this point, the applicability of ion bombardment induced magnetic patterning (IBMP) in general and the combination of IBMP and MTJs in particular is investigated and new applications are developed.
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Höink V. Magnetoresistance and ion bombardment induced magnetic patterning. Bielefeld (Germany): Bielefeld University; 2008.
Höink, V. (2008). Magnetoresistance and ion bombardment induced magnetic patterning. Bielefeld (Germany): Bielefeld University.
Höink, V. (2008). Magnetoresistance and ion bombardment induced magnetic patterning. Bielefeld (Germany): Bielefeld University.
Höink, V., 2008. Magnetoresistance and ion bombardment induced magnetic patterning, Bielefeld (Germany): Bielefeld University.
V. Höink, Magnetoresistance and ion bombardment induced magnetic patterning, Bielefeld (Germany): Bielefeld University, 2008.
Höink, V.: Magnetoresistance and ion bombardment induced magnetic patterning. Bielefeld University, Bielefeld (Germany) (2008).
Höink, Volker. Magnetoresistance and ion bombardment induced magnetic patterning. Bielefeld (Germany): Bielefeld University, 2008.
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2017-01-23T12:57:51Z

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