Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness

van Dorp WF, Laczic I, Beyer A, Gölzhäuser A, Wagner JB, Hansen TW, Hagen CW (2011)
Nanotechnology 22(11).

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van Dorp WF, Laczic I, Beyer A, et al. Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology. 2011;22(11).
van Dorp, W. F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J. B., Hansen, T. W., & Hagen, C. W. (2011). Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology, 22(11).
van Dorp, W. F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J. B., Hansen, T. W., and Hagen, C. W. (2011). Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology 22.
van Dorp, W.F., et al., 2011. Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology, 22(11).
W.F. van Dorp, et al., “Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness”, Nanotechnology, vol. 22, 2011.
van Dorp, W.F., Laczic, I., Beyer, A., Gölzhäuser, A., Wagner, J.B., Hansen, T.W., Hagen, C.W.: Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness. Nanotechnology. 22, (2011).
van Dorp, W.F., Laczic, I., Beyer, André, Gölzhäuser, Armin, Wagner, J.B., Hansen, T.W., and Hagen, C.W. “Ultrahigh resolution focused electron beam induced processing: the effect of substrate thickness”. Nanotechnology 22.11 (2011).
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