Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films

Hamelmann F, Haindl G, Aschentrup A, Klipp A, Kleineberg U, Jutzi P, Heinzmann U (2000)
In: Chemical Vapor Deposition CVD XV, ECS Proc. PV. Allendorf MD, Besman TM (Eds);.

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Allendorf, M.D. ; Besman, T.M.
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Chemical Vapor Deposition CVD XV
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Hamelmann F, Haindl G, Aschentrup A, et al. Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films. In: Allendorf MD, Besman TM, eds. Chemical Vapor Deposition CVD XV, ECS Proc. PV. 2000.
Hamelmann, F., Haindl, G., Aschentrup, A., Klipp, A., Kleineberg, U., Jutzi, P., & Heinzmann, U. (2000). Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films. In M. D. Allendorf & T. M. Besman (Eds.), Chemical Vapor Deposition CVD XV, ECS Proc. PV.
Hamelmann, F., Haindl, G., Aschentrup, A., Klipp, A., Kleineberg, U., Jutzi, P., and Heinzmann, U. (2000). “Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films” in Chemical Vapor Deposition CVD XV, ECS Proc. PV, ed. M. D. Allendorf and T. M. Besman.
Hamelmann, F., et al., 2000. Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films. In M. D. Allendorf & T. M. Besman, eds. Chemical Vapor Deposition CVD XV, ECS Proc. PV.
F. Hamelmann, et al., “Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films”, Chemical Vapor Deposition CVD XV, ECS Proc. PV, M.D. Allendorf and T.M. Besman, eds., 2000.
Hamelmann, F., Haindl, G., Aschentrup, A., Klipp, A., Kleineberg, U., Jutzi, P., Heinzmann, U.: Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films. In: Allendorf, M.D. and Besman, T.M. (eds.) Chemical Vapor Deposition CVD XV, ECS Proc. PV. (2000).
Hamelmann, Frank, Haindl, G., Aschentrup, A., Klipp, A., Kleineberg, U., Jutzi, Peter, and Heinzmann, Ulrich. “Plasma enhanced MOCVD of smooth nanometer-sized Metal/Silicon Single- and multilayer films”. Chemical Vapor Deposition CVD XV, ECS Proc. PV. Ed. M.D. Allendorf and T.M. Besman. 2000.
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