X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist

Zharnikov M, Shaporenko A, Paul A, Gölzhäuser A, Schow A (2005)
Journal of Physical Chemistry B 109(11): 5168-5174.

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Zharnikov M, Shaporenko A, Paul A, Gölzhäuser A, Schow A. X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B. 2005;109(11):5168-5174.
Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, A., & Schow, A. (2005). X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B, 109(11), 5168-5174.
Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, A., and Schow, A. (2005). X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B 109, 5168-5174.
Zharnikov, M., et al., 2005. X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B, 109(11), p 5168-5174.
M. Zharnikov, et al., “X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist”, Journal of Physical Chemistry B, vol. 109, 2005, pp. 5168-5174.
Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, A., Schow, A.: X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist. Journal of Physical Chemistry B. 109, 5168-5174 (2005).
Zharnikov, M., Shaporenko, A., Paul, A., Gölzhäuser, Armin, and Schow, A. “X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist”. Journal of Physical Chemistry B 109.11 (2005): 5168-5174.
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