In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors

Hamelmann F, Klipp A, Petri SHA, Haindl G, Hartwich J, Kleineberg U, Jutzi P, Heinzmann U (2000)
In: Organosilicon Chemistry IV: from Molecules to Materials. Auer N, Weis J (Eds); Weinheim: Wiley-VCH: 798-798.

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Konferenzbeitrag | Veröffentlicht | Englisch
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Titel des Konferenzbandes
Organosilicon Chemistry IV: from Molecules to Materials
Seite
798-798
Konferenz
4. Münchner Silicontage
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Hamelmann F, Klipp A, Petri SHA, et al. In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors. In: Auer N, Weis J, eds. Organosilicon Chemistry IV: from Molecules to Materials. Weinheim: Wiley-VCH; 2000: 798-798.
Hamelmann, F., Klipp, A., Petri, S. H. A., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., et al. (2000). In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors. In N. Auer & J. Weis (Eds.), Organosilicon Chemistry IV: from Molecules to Materials (pp. 798-798). Weinheim: Wiley-VCH.
Hamelmann, F., Klipp, A., Petri, S. H. A., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., and Heinzmann, U. (2000). “In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors” in Organosilicon Chemistry IV: from Molecules to Materials, Auer, N., and Weis, J. eds. (Weinheim: Wiley-VCH), 798-798.
Hamelmann, F., et al., 2000. In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors. In N. Auer & J. Weis, eds. Organosilicon Chemistry IV: from Molecules to Materials. Weinheim: Wiley-VCH, pp. 798-798.
F. Hamelmann, et al., “In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors”, Organosilicon Chemistry IV: from Molecules to Materials, N. Auer and J. Weis, eds., Weinheim: Wiley-VCH, 2000, pp.798-798.
Hamelmann, F., Klipp, A., Petri, S.H.A., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., Heinzmann, U.: In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors. In: Auer, N. and Weis, J. (eds.) Organosilicon Chemistry IV: from Molecules to Materials. p. 798-798. Wiley-VCH, Weinheim (2000).
Hamelmann, Frank, Klipp, A., Petri, S.H.A., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, Peter, and Heinzmann, Ulrich. “In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors”. Organosilicon Chemistry IV: from Molecules to Materials. Ed. Norbert Auer and Johann Weis. Weinheim: Wiley-VCH, 2000. 798-798.

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