In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors

Hamelmann F, Klipp A, Petri SHA, Haindl G, Hartwich J, Kleineberg U, Jutzi P, Heinzmann U (2000)
In: Organosilicon Chemistry from Molecules to Materials IV, eds N.Auner,J.Weis. VCH Weinheim: 798-798.

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Hamelmann F, Klipp A, Petri SHA, et al. In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors. In: Organosilicon Chemistry from Molecules to Materials IV, eds N.Auner,J.Weis. VCH Weinheim; 2000: 798-798.
Hamelmann, F., Klipp, A., Petri, S. H. A., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., et al. (2000). In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors. Organosilicon Chemistry from Molecules to Materials IV, eds N.Auner,J.Weis, 798-798.
Hamelmann, F., Klipp, A., Petri, S. H. A., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., and Heinzmann, U. (2000). “In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors” in Organosilicon Chemistry from Molecules to Materials IV, eds N.Auner,J.Weis (VCH Weinheim), 798-798.
Hamelmann, F., et al., 2000. In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors. In Organosilicon Chemistry from Molecules to Materials IV, eds N.Auner,J.Weis. VCH Weinheim, pp. 798-798.
F. Hamelmann, et al., “In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors”, Organosilicon Chemistry from Molecules to Materials IV, eds N.Auner,J.Weis, VCH Weinheim: 2000, pp.798-798.
Hamelmann, F., Klipp, A., Petri, S.H.A., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., Heinzmann, U.: In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors. Organosilicon Chemistry from Molecules to Materials IV, eds N.Auner,J.Weis. p. 798-798. VCH Weinheim (2000).
Hamelmann, Frank, Klipp, A., Petri, S.H.A., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, Peter, and Heinzmann, Ulrich. “In situ controlled deposition of thin silicon films by hot filament MOCVD with (C5Me5) Si2H5 and (C5Me4H)SiH3 as silicon precursors”. Organosilicon Chemistry from Molecules to Materials IV, eds N.Auner,J.Weis. VCH Weinheim, 2000. 798-798.
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