Characterization of DMPC bilayers and multilamellar islands on hydrophobic Self-Assembled Monolayers of ODS/Si (100) and mixed ODS-DDS/Si (100) by nc-AFM and X-ray reflectometry

Brechling A, Sundermann M, Kleineberg U, Heinzmann U (2003)
Thin Solid Films 433: 281-281.

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Brechling A, Sundermann M, Kleineberg U, Heinzmann U. Characterization of DMPC bilayers and multilamellar islands on hydrophobic Self-Assembled Monolayers of ODS/Si (100) and mixed ODS-DDS/Si (100) by nc-AFM and X-ray reflectometry. Thin Solid Films 433. 2003:281-281.
Brechling, A., Sundermann, M., Kleineberg, U., & Heinzmann, U. (2003). Characterization of DMPC bilayers and multilamellar islands on hydrophobic Self-Assembled Monolayers of ODS/Si (100) and mixed ODS-DDS/Si (100) by nc-AFM and X-ray reflectometry. Thin Solid Films 433, 281-281.
Brechling, A., Sundermann, M., Kleineberg, U., and Heinzmann, U. (2003). Characterization of DMPC bilayers and multilamellar islands on hydrophobic Self-Assembled Monolayers of ODS/Si (100) and mixed ODS-DDS/Si (100) by nc-AFM and X-ray reflectometry. Thin Solid Films 433, 281-281.
Brechling, A., et al., 2003. Characterization of DMPC bilayers and multilamellar islands on hydrophobic Self-Assembled Monolayers of ODS/Si (100) and mixed ODS-DDS/Si (100) by nc-AFM and X-ray reflectometry. Thin Solid Films 433, , p 281-281.
A. Brechling, et al., “Characterization of DMPC bilayers and multilamellar islands on hydrophobic Self-Assembled Monolayers of ODS/Si (100) and mixed ODS-DDS/Si (100) by nc-AFM and X-ray reflectometry”, Thin Solid Films 433, 2003, pp. 281-281.
Brechling, A., Sundermann, M., Kleineberg, U., Heinzmann, U.: Characterization of DMPC bilayers and multilamellar islands on hydrophobic Self-Assembled Monolayers of ODS/Si (100) and mixed ODS-DDS/Si (100) by nc-AFM and X-ray reflectometry. Thin Solid Films 433. 281-281 (2003).
Brechling, Armin, Sundermann, M., Kleineberg, U., and Heinzmann, Ulrich. “Characterization of DMPC bilayers and multilamellar islands on hydrophobic Self-Assembled Monolayers of ODS/Si (100) and mixed ODS-DDS/Si (100) by nc-AFM and X-ray reflectometry”. Thin Solid Films 433 (2003): 281-281.
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